Inventor
SHIMIZU CHIYUKI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “SHIMIZU CHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA SILICONE
15 patentsUS4358558ANov 9, 1982
Room temperature curable polyorganosiloxane compositions
TOSHIBA SILICONE29 citations92
US4395443AJul 26, 1983
Method of forming silicone films
TOSHIBA SILICONE42 citations86
US4933415AJun 12, 1990
Polyether end-blocked with hydrolyzable silyl groups, method of manufacturing and room temperature curable composition using the polyether
TOSHIBA SILICONE16 citations80
US4786667ANov 22, 1988
Polyether end-blocked with hydrolyzable silyl groups, method of manufacturing and room temperature curable composition using the polyether
TOSHIBA SILICONE23 citations80
US5093389AMar 3, 1992
Room temperature-curable composition
TOSHIBA SILICONE16 citations73
US5061739AOct 29, 1991
Room temperature curing compositions
TOSHIBA SILICONE12 citations73
US4476278AOct 9, 1984
Dustproof film forming material
TOSHIBA SILICONE7 citations73
US4374950AFeb 22, 1983
Adhesive polyorganosiloxane composition
TOSHIBA SILICONE16 citations73
US4367293AJan 4, 1983
Composition forming elastic foam at room temperature
TOSHIBA SILICONE7 citations73
US5013807AMay 7, 1991
Room-temperature curable composition
TOSHIBA SILICONE10 citations72
US5004793AApr 2, 1991
Room temperature-curable composition
TOSHIBA SILICONE9 citations72
US4950707AAug 21, 1990
Polyether end-blocked with hydrolyzable silyl groups, method of manufacturing and room temperature curable composition using the polyether
TOSHIBA SILICONE7 citations72
US4873272AOct 10, 1989
Polyether end-blocked with hydrolyzable silyl groups, method of manufacturing and room temperature curable composition using the polyether
TOSHIBA SILICONE12 citations72
US4847357AJul 11, 1989
Polyether end-blocked with hydrolyzable silyl groups, method of manufacturing and room temperature curable composition thereof
TOSHIBA SILICONE7 citations72
US4877855AOct 31, 1989
Siloxane-amide block copolymer and process for producing the same
TOSHIBA SILICONE6 citations61