Inventor
SHIGETA ATSUSHI
JP44 patents
⚠️ This page may combine multiple inventors who share the name “SHIGETA ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
23 patentsUS5948205ASep 7, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK41 citations96
US5914275AJun 22, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK43 citations96
US5695601ADec 9, 1997
Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
TOSHIBA KK60 citations96
US5597341AJan 28, 1997
Semiconductor planarizing apparatus
TOSHIBA KK60 citations96
US5445996AAug 29, 1995
Method for planarizing a semiconductor device having a amorphous layer
TOSHIBA KK87 citations96
US5398459AMar 21, 1995
Method and apparatus for polishing a workpiece
TOSHIBA KK74 citations96
US7217662B2May 15, 2007
Method of processing a substrate
TOSHIBA KK26 citations92
US7014529B1Mar 21, 2006
Substrate processing method and substrate processing apparatus
TOSHIBA KK26 citations92
US6997782B2Feb 14, 2006
Polishing apparatus and a method of polishing and cleaning and drying a wafer
TOSHIBA KK16 citations92
US7005382B2Feb 28, 2006
Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing
TOSHIBA KK30 citations91
US7744445B2Jun 29, 2010
Polishing apparatus and polishing method
TOSHIBA KK26 citations90
US7638439B2Dec 29, 2009
Peripheral processing method and method of manufacturing a semiconductor device
TOSHIBA KK12 citations82
US7402521B2Jul 22, 2008
Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor
TOSHIBA KK8 citations74
US5578531ANov 26, 1996
Method for manufacturing semiconductor device
TOSHIBA KK18 citations74
US6743645B2Jun 1, 2004
Method of inspecting process for manufacturing semiconductor device and method of manufacturing semiconductor device
TOSHIBA KK11 citations73
US7435682B2Oct 14, 2008
Method of manufacturing semiconductor device
TOSHIBA KK8 citations72
US7700489B2Apr 20, 2010
Method of manufacturing a semiconductor device
TOSHIBA KK4 citations63
US7452819B2Nov 18, 2008
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
TOSHIBA KK3 citations63
US7416942B2Aug 26, 2008
Method for manufacturing semiconductor device
TOSHIBA KK5 citations63
US7241205B2Jul 10, 2007
Method of processing a substrate
TOSHIBA KK5 citations62
US7198552B2Apr 3, 2007
Polishing apparatus
TOSHIBA KK2 citations62
US6984532B2Jan 10, 2006
Method of judging residual film by optical measurement
TOSHIBA KK3 citations62
US7413989B2Aug 19, 2008
Method of manufacturing semiconductor device
TOSHIBA KK1 citations51
EBARA CORP
9 patentsUS5679059AOct 21, 1997
Polishing aparatus and method
EBARA CORP110 citations98
US5860181AJan 19, 1999
Method of and apparatus for cleaning workpiece
EBARA CORP64 citations95
US5653623AAug 5, 1997
Polishing apparatus with improved exhaust
EBARA CORP38 citations93
US6500051B1Dec 31, 2002
Polishing apparatus and method
EBARA CORP25 citations92
US5830041ANov 3, 1998
Method and apparatus for determining endpoint during a polishing process
EBARA CORP49 citations92
US5846335ADec 8, 1998
Method for cleaning workpiece
EBARA CORP40 citations91
US7767472B2Aug 3, 2010
Substrate processing method and substrate processing apparatus
EBARA CORP2 citations62
US10207390B2Feb 19, 2019
Processing end point detection method, polishing method, and polishing apparatus
EBARA CORP1 citations61
US8777694B2Jul 15, 2014
Polishing endpoint detection method
EBARA CORP0 citations51