Inventor
YAJIMA HIROMI
JP28 patents
⚠️ This page may combine multiple inventors who share the name “YAJIMA HIROMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
14 patentsUS5948205ASep 7, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK41 citations96
US5914275AJun 22, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK43 citations96
US5695601ADec 9, 1997
Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
TOSHIBA KK60 citations96
US5597341AJan 28, 1997
Semiconductor planarizing apparatus
TOSHIBA KK60 citations96
US5445996AAug 29, 1995
Method for planarizing a semiconductor device having a amorphous layer
TOSHIBA KK87 citations96
US5827110AOct 27, 1998
Polishing facility
TOSHIBA KK64 citations94
US6443808B2Sep 3, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations93
US6439971B2Aug 27, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK20 citations93
US6425806B2Jul 30, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations93
US6997782B2Feb 14, 2006
Polishing apparatus and a method of polishing and cleaning and drying a wafer
TOSHIBA KK16 citations92
US7065725B2Jun 20, 2006
Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus
TOSHIBA KK14 citations82
US6273802B1Aug 14, 2001
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations82
US7198552B2Apr 3, 2007
Polishing apparatus
TOSHIBA KK2 citations62
US7478347B2Jan 13, 2009
Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus
TOSHIBA KK3 citations61
EBARA CORP
13 patentsUS5679059AOct 21, 1997
Polishing aparatus and method
EBARA CORP110 citations98
US5885138AMar 23, 1999
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP75 citations97
US6036582AMar 14, 2000
Polishing apparatus
EBARA CORP61 citations96
US5860847AJan 19, 1999
Polishing apparatus
EBARA CORP63 citations96
US5704827AJan 6, 1998
Polishing apparatus including cloth cartridge connected to turntable
EBARA CORP67 citations95
US6500051B1Dec 31, 2002
Polishing apparatus and method
EBARA CORP25 citations92
US6413154B1Jul 2, 2002
Polishing apparatus
EBARA CORP25 citations92
US6547638B2Apr 15, 2003
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP12 citations82
US6221171B1Apr 24, 2001
Method and apparatus for conveying a workpiece
EBARA CORP11 citations73
US6966821B2Nov 22, 2005
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP2 citations63
US6595220B2Jul 22, 2003
Apparatus for conveying a workpiece
EBARA CORP3 citations62
US6227954B1May 8, 2001
Polishing apparatus
EBARA CORP1 citations52
US7708618B2May 4, 2010
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP0 citations50