Inventor
IKEZAWA HIRONORI
JP13 patents
Patents
13 patentsUS7580197B2Aug 25, 2009
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP34 citations96
US7362508B2Apr 22, 2008
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP46 citations96
US7688517B2Mar 30, 2010
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP12 citations92
US7619827B2Nov 17, 2009
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP10 citations92
US7609455B2Oct 27, 2009
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP10 citations92
US6788389B2Sep 7, 2004
Production method of projection optical system
NIKON CORP47 citations91
US7701640B2Apr 20, 2010
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP8 citations84
US7551362B2Jun 23, 2009
Projection optical system and method for photolithography and exposure apparatus and method using same
NIKON CORP8 citations84
US7710653B2May 4, 2010
Projection optical system, exposure system, and exposure method
NIKON CORP4 citations62
US7688422B2Mar 30, 2010
Projection optical system, exposure system, and exposure method
NIKON CORP2 citations62
US7557997B2Jul 7, 2009
Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
NIKON CORP4 citations62
US7978310B2Jul 12, 2011
Projection optical system, exposure system, and exposure method
NIKON CORP0 citations52
US7471374B2Dec 30, 2008
Projection optical system, exposure apparatus, and exposure method
NIKON CORP0 citations49