Inventor
MATSUYAMA HIDETO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “MATSUYAMA HIDETO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
9 patentsUS6423192B1Jul 23, 2002
Sputtering apparatus and film forming method
TOSHIBA KK91 citations98
US6025117AFeb 15, 2000
Method of forming a pattern using polysilane
TOSHIBA KK423 citations98
US6746969B2Jun 8, 2004
Method of manufacturing semiconductor device
TOSHIBA KK27 citations92
US6270948B1Aug 7, 2001
Method of forming pattern
TOSHIBA KK54 citations92
US7923839B2Apr 12, 2011
Semiconductor device and method for fabricating semiconductor device
TOSHIBA KK7 citations84
US7927967B2Apr 19, 2011
Method for manufacturing semiconductor memory device
TOSHIBA KK9 citations80
US7605076B2Oct 20, 2009
Method of manufacturing a semiconductor device from which damage layers and native oxide films in connection holes have been removed
TOSHIBA KK2 citations61
US7709376B2May 4, 2010
Method for fabricating semiconductor device and semiconductor device
TOSHIBA KK5 citations60
US8008190B2Aug 30, 2011
Method of manufacturing semiconductor device
TOSHIBA KK1 citations52
RENAISSANCE ENERGY RES CORP
3 patentsUS9597632B2Mar 21, 2017
Selectively CO 2-permeable membrane, method for separating CO2 from mixed gas, and membrane separation equipment
RENAISSANCE ENERGY RES CORP2 citations70
US8617297B2Dec 31, 2013
CO2-facilitated transport membrane and method for producing the same
RENAISSANCE ENERGY RES CORP2 citations60
US8377170B2Feb 19, 2013
CO2-facilitated transport membrane and method for producing the same
RENAISSANCE ENERGY RES CORP4 citations60