Inventor

CHENG JOY

TW76 patents

⚠️ This page may combine multiple inventors who share the name “CHENG JOY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHENG JOY

TAIWAN SEMICONDUCTOR MFG CO LTD

Semiconductor method of protecting wafer from bevel contamination

Photoresist developer and method of developing photoresist

EUV metallic resist performance enhancement via additives

Extreme ultraviolet photolithography method with developer composition

Methods of reducing pattern roughness in semiconductor fabrication

FinFET structures and methods of forming the same

EUV metallic resist performance enhancement via additives

Extreme ultraviolet photolithography method with developer composition

Metal-compound-removing solvent and method in lithography

Metal-compound-removing solvent and method in lithography

Material composition and methods thereof

Metal-compound-removing solvent and method in lithography

Humidity control in EUV lithography

Method of patterning a film layer

EUV metallic resist performance enhancement via additives

Metal-compound-removing solvent and method in lithography

Extreme ultraviolet photolithography method with developer composition

Humidity control in EUV lithography

Semiconductor method of protecting wafer from bevel contamination

IBM

Method of forming polymer features by directed self-assembly of block copolymers

Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films

Methods of reducing defects in directed self-assembled structures

Pattern decomposition for directed self assembly patterns templated by sidewall image transfer

Method of controlling orientation of domains in block copolymer films

Orienting, positioning, and forming nanoscale structures

Additives for orientation control of block copolymers

Formation of a composite pattern including a periodic pattern self-aligned to a prepattern

Simultaneous photoresist development and neutral polymer layer formation

Pattern decomposition for directed self assembly patterns templated by sidewall image transfer

Graphoepitaxy directed self-assembly process for semiconductor fin formation

Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

Block copolymers for directed self-assembly applications

Fluoro-alcohol additives for orientation control of block copolymers

Orientation control materials for block copolymers used in directed self-assembly applications

Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

CHENG JOY

Method of forming sub-lithographic features using directed self-assembly of polymers

Method of forming polymer features by directed self-assembly of block copolymers

Methods of directed self-assembly and layered structures formed therefrom

Method of controlling orientation of domains in block copolymer films

Method for designing optical lithography masks for directed self-assembly

Methods of directed self-assembly and layered structures formed therefrom

Composite filtration membranes and methods of preparation thereof

Methods of directed self-assembly, and layered structures formed therefrom

Method for designing optical lithography masks for directed self-assembly

Methods of forming topographical features using segregating polymer mixtures

Directed self-assembly of block copolymers using segmented prepatterns

Self-segregating multilayer imaging stack with built-in antireflective properties

Methods for forming surface features using self-assembling masks

BOREALIS AG

Multimodal polyethylene polymers and methods of making and using the same

Composition and process