Inventor
GRIMARD DENNIS S
US25 patents
⚠️ This page may combine multiple inventors who share the name “GRIMARD DENNIS S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
21 patentsUS6108189AAug 22, 2000
Electrostatic chuck having improved gas conduits
APPLIED MATERIALS INC255 citations99
US6095084AAug 1, 2000
High density plasma process chamber
APPLIED MATERIALS INC250 citations99
US6721162B2Apr 13, 2004
Electrostatic chuck having composite dielectric layer and method of manufacture
APPLIED MATERIALS INC76 citations98
US6320736B1Nov 20, 2001
Chuck having pressurized zones of heat transfer gas
APPLIED MATERIALS INC122 citations98
US6310755B1Oct 30, 2001
Electrostatic chuck having gas cavity and method
APPLIED MATERIALS INC325 citations98
US6074488AJun 13, 2000
Plasma chamber support having an electrically coupled collar ring
APPLIED MATERIALS INC118 citations98
US5903428AMay 11, 1999
Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same
APPLIED MATERIALS INC300 citations98
US6538872B1Mar 25, 2003
Electrostatic chuck having heater and method
APPLIED MATERIALS INC123 citations97
US6490146B2Dec 3, 2002
Electrostatic chuck bonded to base with a bond layer and method
APPLIED MATERIALS INC88 citations97
US6478924B1Nov 12, 2002
Plasma chamber support having dual electrodes
APPLIED MATERIALS INC124 citations97
US6581275B2Jun 24, 2003
Fabricating an electrostatic chuck having plasma resistant gas conduits
APPLIED MATERIALS INC74 citations96
US6490144B1Dec 3, 2002
Support for supporting a substrate in a process chamber
APPLIED MATERIALS INC57 citations96
US6462928B1Oct 8, 2002
Electrostatic chuck having improved electrical connector and method
APPLIED MATERIALS INC65 citations96
US6414834B1Jul 2, 2002
Dielectric covered electrostatic chuck
APPLIED MATERIALS INC56 citations96
US6151203ANov 21, 2000
Connectors for an electrostatic chuck and combination thereof
APPLIED MATERIALS INC76 citations95
US6494958B1Dec 17, 2002
Plasma chamber support with coupled electrode
APPLIED MATERIALS INC74 citations94
US6273958B2Aug 14, 2001
Substrate support for plasma processing
APPLIED MATERIALS INC20 citations92
US7813103B2Oct 12, 2010
Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes
APPLIED MATERIALS INC14 citations84
US7510665B2Mar 31, 2009
Plasma generation and control using dual frequency RF signals
APPLIED MATERIALS INC17 citations84
US7838430B2Nov 23, 2010
Plasma control using dual cathode frequency mixing
APPLIED MATERIALS INC8 citations83
US6642489B2Nov 4, 2003
Method and apparatus for improving exhaust gas consumption in an exhaust conduit
APPLIED MATERIALS INC2 citations62