Inventor
FURUYA YUICHI
JP11 patents
Patents
11 patentsUS11441224B2Sep 13, 2022
Method of controlling substrate processing apparatus, and substrate processing apparatus
TOKYO ELECTRON LTD2 citations70
US12392033B2Aug 19, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations60
US12400841B2Aug 26, 2025
Trap device and semiconductor manufacturing device
TOKYO ELECTRON LTD0 citations52
US12344930B2Jul 1, 2025
Deposition method and deposition apparatus
TOKYO ELECTRON LTD0 citations50
US11796460B2Oct 24, 2023
Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR gas, and absorbance analysis program recording medium on which program for DCR gas is recorded
TOKYO ELECTRON LTD0 citations50
US11753720B2Sep 12, 2023
Film forming apparatus, source supply apparatus, and film forming method
TOKYO ELECTRON LTD0 citations50
US11466365B2Oct 11, 2022
Film-forming apparatus
TOKYO ELECTRON LTD0 citations49
US11306847B2Apr 19, 2022
Valve device, processing apparatus, and control method
TOKYO ELECTRON LTD0 citations49
US11193205B2Dec 7, 2021
Source material container
TOKYO ELECTRON LTD0 citations48
US12571104B2Mar 10, 2026
Source gas supply method, source gas supply mechanism, and film forming system
TOKYO ELECTRON LTD0 citations45
US10156014B2Dec 18, 2018
Gas treatment apparatus and gas treatment method
TOKYO ELECTRON LTD0 citations38