Inventor
PRASAD RAJESH
US23 patents
⚠️ This page may combine multiple inventors who share the name “PRASAD RAJESH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
13 patentsUS11469107B2Oct 11, 2022
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC4 citations80
US10727059B2Jul 28, 2020
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC6 citations79
US12347687B2Jul 1, 2025
Etch rate modulation of FinFET through high-temperature ion implantation
APPLIED MATERIALS INC1 citations62
US12142475B2Nov 12, 2024
Sequential plasma and thermal treatment
APPLIED MATERIALS INC0 citations61
US12469700B2Nov 11, 2025
Ion implantation for reduced hydrogen incorporation in amorphous silicon
APPLIED MATERIALS INC0 citations60
US12581884B2Mar 17, 2026
Methods for oxidizing a silicon hardmask using ion implant
APPLIED MATERIALS INC0 citations59
US12112949B2Oct 8, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59
US12014927B2Jun 18, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59
US11756796B2Sep 12, 2023
Techniques for improved low dielectric constant film processing
APPLIED MATERIALS INC0 citations59
US12444615B2Oct 14, 2025
Forming a doped hardmask
APPLIED MATERIALS INC0 citations57
US11626284B2Apr 11, 2023
Method of forming a 2-dimensional channel material, using ion implantation
APPLIED MATERIALS INC0 citations57
US11551904B2Jan 10, 2023
System and technique for profile modulation using high tilt angles
APPLIED MATERIALS INC0 citations56
US11114299B2Sep 7, 2021
Techniques for reducing tip to tip shorting and critical dimension variation during nanoscale patterning
APPLIED MATERIALS INC0 citations51
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
8 patentsUS10403738B1Sep 3, 2019
Techniques for improved spacer in nanosheet device
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC11 citations84
US10332748B2Jun 25, 2019
Etch rate modulation through ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations69
US9934982B2Apr 3, 2018
Etch rate modulation through ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations69
US10811257B2Oct 20, 2020
Techniques for forming low stress etch-resistant mask using implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations59
US10354875B1Jul 16, 2019
Techniques for improved removal of sacrificial mask
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations55
US10804156B2Oct 13, 2020
Techniques for forming dual epitaxial source/drain semiconductor device
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations52
US10515802B2Dec 24, 2019
Techniques for forming low stress mask using implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations52
US10629437B2Apr 21, 2020
Techniques and structure for forming dynamic random-access device using angled ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations41