Inventor
OSHIO HIDETAKA
JP8 patents
Patents
8 patentsUS11469107B2Oct 11, 2022
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC4 citations80
US10727059B2Jul 28, 2020
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC6 citations79
US11527408B2Dec 13, 2022
Multiple spacer patterning schemes
APPLIED MATERIALS INC4 citations71
US12183578B2Dec 31, 2024
Method for forming and patterning a layer and/or substrate
APPLIED MATERIALS INC0 citations62
US11145509B2Oct 12, 2021
Method for forming and patterning a layer and/or substrate
APPLIED MATERIALS INC1 citations62
US11315787B2Apr 26, 2022
Multiple spacer patterning schemes
APPLIED MATERIALS INC0 citations60
US12112949B2Oct 8, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59
US12014927B2Jun 18, 2024
Highly etch selective amorphous carbon film
APPLIED MATERIALS INC0 citations59