Inventor
FUJIKAWA MAKOTO
JP21 patents
⚠️ This page may combine multiple inventors who share the name “FUJIKAWA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
9 patentsUS6496083B1Dec 17, 2002
Diode compensation circuit including two series and one parallel resonance points
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD76 citations96
US6147571ANov 14, 2000
Dual-band multilayer bandpass filter
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD71 citations94
US6608534B2Aug 19, 2003
Matching circuit chip, filter with matching circuit, duplexer and cellular phone
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD15 citations92
US6492886B1Dec 10, 2002
Laminated filter, duplexer, and mobile communication apparatus using the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD22 citations92
US6085071AJul 4, 2000
Antenna duplexer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD48 citations92
US5828275AOct 27, 1998
Dielectric filter including an adjusted inner electrode and a coupling electrode being level with an open end of a molded member
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD41 citations92
US7313860B2Jan 1, 2008
Mounting device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations84
US6608533B2Aug 19, 2003
Matching circuit chip, filter with matching circuit, duplexer and cellular phone
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations74
US6326863B1Dec 4, 2001
Matching circuit chip, filter with matching circuit, duplexer and cellular phone
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations74
TOKYO ELECTRON LTD
9 patentsUS10960435B2Mar 30, 2021
Film forming apparatus, film forming method, and storage medium
TOKYO ELECTRON LTD2 citations73
US10446438B2Oct 15, 2019
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD2 citations73
US10755971B2Aug 25, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations52
US10748782B2Aug 18, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations52
US10629448B2Apr 21, 2020
Method of manufacturing semiconductor device and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US10490405B2Nov 26, 2019
Semiconductor device manufacturing method, substrate processing apparatus and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US9708507B2Jul 18, 2017
Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method
TOKYO ELECTRON LTD0 citations52
US10790135B2Sep 29, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations51
US9683128B2Jun 20, 2017
Polymerized film forming method
TOKYO ELECTRON LTD0 citations42