Inventor
MATSUI SHIN
JP17 patents
Patents
17 patentsUS6408045B1Jun 18, 2002
Stage system and exposure apparatus with the same
CANON KK113 citations97
US6984362B2Jan 10, 2006
Processing apparatus, measuring apparatus, and device manufacturing method
CANON KK26 citations92
US6862080B2Mar 1, 2005
Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
CANON KK25 citations92
US6616898B2Sep 9, 2003
Processing apparatus with pressure control and gas recirculation system
CANON KK36 citations92
US6404505B2Jun 11, 2002
Positioning stage system and position measuring method
CANON KK22 citations92
US6225637B1May 1, 2001
Electron beam exposure apparatus
CANON KK43 citations92
US6054713AApr 25, 2000
Electron beam exposure apparatus
CANON KK41 citations92
US5999589ADec 7, 1999
Substrate holding device and exposing apparatus using the same
CANON KK28 citations92
US5883932AMar 16, 1999
Substrate holding device and exposing apparatus using the same
CANON KK38 citations92
US5930324AJul 27, 1999
Exposure apparatus and device manufacturing method using the same
CANON KK13 citations74
US5277539AJan 11, 1994
Substrate conveying apparatus
CANON KK14 citations74
US7187432B2Mar 6, 2007
Holding system, exposure apparatus, and device manufacturing method
CANON KK9 citations73
US6982784B2Jan 3, 2006
Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
CANON KK6 citations73
US7566422B2Jul 28, 2009
Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus
CANON KK3 citations63
US7218383B2May 15, 2007
Holding system, exposure apparatus, and device manufacturing method
CANON KK3 citations62
US7102735B2Sep 5, 2006
Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
CANON KK2 citations62
US6930756B2Aug 16, 2005
Electron beam exposure apparatus and semiconductor device manufacturing method
CANON KK5 citations62