Inventor
HOSOKAWA AKIHIRO
US49 patents
⚠️ This page may combine multiple inventors who share the name “HOSOKAWA AKIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
28 patentsUS7073834B2Jul 11, 2006
Multiple section end effector assembly
APPLIED MATERIALS INC482 citations99
US6917755B2Jul 12, 2005
Substrate support
APPLIED MATERIALS INC493 citations99
US5345999ASep 13, 1994
Method and apparatus for cooling semiconductor wafers
APPLIED MATERIALS INC276 citations99
US6949143B1Sep 27, 2005
Dual substrate loadlock process equipment
APPLIED MATERIALS INC57 citations96
US6773562B1Aug 10, 2004
Shadow frame for substrate processing
APPLIED MATERIALS INC54 citations96
US6634686B2Oct 21, 2003
End effector assembly
APPLIED MATERIALS INC56 citations96
US6460369B2Oct 8, 2002
Consecutive deposition system
APPLIED MATERIALS INC53 citations96
US5799860ASep 1, 1998
Preparation and bonding of workpieces to form sputtering targets and other assemblies
APPLIED MATERIALS INC56 citations95
US7644745B2Jan 12, 2010
Bonding of target tiles to backing plate with patterned bonding agent
APPLIED MATERIALS INC35 citations92
US7316763B2Jan 8, 2008
Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
APPLIED MATERIALS INC27 citations92
US7022948B2Apr 4, 2006
Chamber for uniform substrate heating
APPLIED MATERIALS INC23 citations91
US6765178B2Jul 20, 2004
Chamber for uniform substrate heating
APPLIED MATERIALS INC37 citations91
US6825447B2Nov 30, 2004
Apparatus and method for uniform substrate heating and contaminate collection
APPLIED MATERIALS INC32 citations88
US7550055B2Jun 23, 2009
Elastomer bonding of large area sputtering target
APPLIED MATERIALS INC30 citations86
US7815782B2Oct 19, 2010
PVD target
APPLIED MATERIALS INC17 citations84
US7641434B2Jan 5, 2010
Dual substrate loadlock process equipment
APPLIED MATERIALS INC11 citations84
US7432184B2Oct 7, 2008
Integrated PVD system using designated PVD chambers
APPLIED MATERIALS INC18 citations84
US7429718B2Sep 30, 2008
Heating and cooling of substrate support
APPLIED MATERIALS INC17 citations84
US6998579B2Feb 14, 2006
Chamber for uniform substrate heating
APPLIED MATERIALS INC14 citations84
US6623563B2Sep 23, 2003
Susceptor with bi-metal effect
APPLIED MATERIALS INC13 citations84
US7652223B2Jan 26, 2010
Electron beam welding of sputtering target tiles
APPLIED MATERIALS INC17 citations83
US5106200AApr 21, 1992
Apparatus for measuring temperature of wafer
APPLIED MATERIALS INC20 citations82
US7976635B2Jul 12, 2011
Dual substrate loadlock process equipment
APPLIED MATERIALS INC5 citations74
US7442900B2Oct 28, 2008
Chamber for uniform heating of large area substrates
APPLIED MATERIALS INC7 citations74
US7879210B2Feb 1, 2011
Partially suspended rolling magnetron
APPLIED MATERIALS INC2 citations63
US7566900B2Jul 28, 2009
Integrated metrology tools for monitoring and controlling large area substrate processing chambers
APPLIED MATERIALS INC6 citations62
US7628899B2Dec 8, 2009
Apparatus and method of positioning a multizone magnetron assembly
APPLIED MATERIALS INC4 citations57
US7505832B2Mar 17, 2009
Method and apparatus for determining a substrate exchange position in a processing system
APPLIED MATERIALS INC5 citations55
APPLIED KOMATSU TECHNOLOGY INC
6 patentsUS5716133AFeb 10, 1998
Shielded heat sensor for measuring temperature
APPLIED KOMATSU TECHNOLOGY INC524 citations99
US5518593AMay 21, 1996
Shield configuration for vacuum chamber
APPLIED KOMATSU TECHNOLOGY INC105 citations98
US6267851B1Jul 31, 2001
Tilted sputtering target with shield to block contaminants
APPLIED KOMATSU TECHNOLOGY INC56 citations96
US5855744AJan 5, 1999
Non-planar magnet tracking during magnetron sputtering
APPLIED KOMATSU TECHNOLOGY INC132 citations93
US6257045B1Jul 10, 2001
Automated substrate processing systems and methods
APPLIED KOMATSU TECHNOLOGY INC31 citations90
US6205870B1Mar 27, 2001
Automated substrate processing systems and methods
APPLIED KOMATSU TECHNOLOGY INC22 citations90
DAINIPPON SCREEN MFG
3 patentsUS7062161B2Jun 13, 2006
Photoirradiation thermal processing apparatus and thermal processing susceptor employed therefor
DAINIPPON SCREEN MFG476 citations99
US6936797B2Aug 30, 2005
Thermal processing method and thermal processing apparatus for substrate employing photoirradiation
DAINIPPON SCREEN MFG38 citations93
US7041939B2May 9, 2006
Thermal processing apparatus and thermal processing method
DAINIPPON SCREEN MFG11 citations84