Inventor

JUNG HYUNG-SUK

KR40 patents

⚠️ This page may combine multiple inventors who share the name “JUNG HYUNG-SUK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JUNG HYUNG-SUK

SAMSUNG ELECTRONICS CO LTD

Method of fabricating metal silicate layer using atomic layer deposition technique

Post thermal treatment methods of forming high dielectric layers in integrated circuit devices

Semiconductor devices having nitrogen-incorporated active region and methods of fabricating the same

Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices

Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices

Semiconductor device

Semiconductor device having different metal gate structures

Semiconductor device and method of fabricating the same

Dual gate stack CMOS structure with different dielectrics

Method of fabricating high-k dielectric layer having reduced impurity

Integrated circuit device

Semiconductor devices and method of manufacturing the same

Semiconductor device

Semiconductor devices having different gate dielectrics and methods for manufacturing the same

CMOS semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Transistors with multilayered dielectric films

Semiconductor device

Methods of manufacturing semiconductor devices

Fabricating method of a semiconductor device

Semiconductor devices having multi-threshold voltage

Dual work function metal gate structure and related method of manufacture

Method for fabricating semiconductor device

Transistors with multilayered dielectric films

Semiconductor device

Methods of manufacturing semiconductor devices

Methods of manufacturing semiconductor devices

Semiconductor devices and method of manufacturing the same

Semiconductor devices having transistors with different work function layers

Dielectric multilayer structures of microelectronic devices and methods for fabricating the same

Method of fabricating semiconductor device

Integrated circuit device

Dual work function metal gate structure and related method of manufacture

Semiconductor devices with dielectric layers

Semiconductor device having insulating pattern and method of forming the same

Methods of manufacturing a semiconductor device including CMOS transistor having different PMOS and NMOS gate electrode structures

LIM HA-JIN

Semiconductor devices and method of forming the same

Transistors with multilayered dielectric films and methods of manufacturing such transistors

KIM WEON-HONG

Method for fabricating semiconductor device including nitrided gate insulator

KIM JONG-PYO

Dielectric multilayer structures of microelectronic devices and methods for fabricating the same