Inventor
OIKAWA AKIRA
JP18 patents
⚠️ This page may combine multiple inventors who share the name “OIKAWA AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
7 patentsUS5707784AJan 13, 1998
Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern
FUJITSU LTD36 citations92
US5240813AAug 31, 1993
Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof
FUJITSU LTD27 citations92
US6127098AOct 3, 2000
Method of making resist patterns
FUJITSU LTD12 citations74
US5723259AMar 3, 1998
Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern
FUJITSU LTD9 citations74
US6120977ASep 19, 2000
Photoresist with bleaching effect
FUJITSU LTD7 citations73
US5484687AJan 16, 1996
Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof
FUJITSU LTD10 citations73
US5693145ADec 2, 1997
Apparatus of formation of chemically amplified resist pattern
FUJITSU LTD1 citations52
KYOCERA CORP
6 patentsUS7154206B2Dec 26, 2006
Surface acoustic wave device and method for manufacturing same
KYOCERA CORP33 citations90
US7513022B2Apr 7, 2009
Method for manufacturing surface acoustic wave device
KYOCERA CORP9 citations82
US7353710B2Apr 8, 2008
Pressure sensor device with surface acoustic wave elements
KYOCERA CORP12 citations80
US10193528B2Jan 29, 2019
Acoustic wave device and acoustic wave module
KYOCERA CORP0 citations51
US11973486B2Apr 30, 2024
Electronic component and method for manufacturing the same
KYOCERA CORP0 citations41
US9773964B2Sep 26, 2017
Electronic component
KYOCERA CORP0 citations41