Inventor
HARMON DAVID L
US18 patents
⚠️ This page may combine multiple inventors who share the name “HARMON DAVID L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
12 patentsUS5330935AJul 19, 1994
Low temperature plasma oxidation process
IBM151 citations98
US7067886B2Jun 27, 2006
Method of assessing potential for charging damage in SOI designs and structures for eliminating potential for damage
IBM95 citations97
US5412246AMay 2, 1995
Low temperature plasma oxidation process
IBM93 citations96
US7096450B2Aug 22, 2006
Enhancement of performance of a conductive wire in a multilayered substrate
IBM41 citations92
US5618379AApr 8, 1997
Selective deposition process
IBM24 citations92
US5298790AMar 29, 1994
Reactive ion etching buffer mask
IBM24 citations91
US5118384AJun 2, 1992
Reactive ion etching buffer mask
IBM41 citations91
US5204138AApr 20, 1993
Plasma enhanced CVD process for fluorinated silicon nitride films
IBM14 citations81
US7132318B2Nov 7, 2006
Method of assessing potential for charging damage in SOI designs and structures for eliminating potential for damage
IBM9 citations73
US5539154AJul 23, 1996
Fluorinated silicon nitride films
IBM8 citations73
US8796108B2Aug 5, 2014
Isolated zener diode, an integrated circuit incorporating multiple instances of the zener diode, a method of forming the zener diode and a design structure for the zener diode
IBM0 citations52
US7511378B2Mar 31, 2009
Enhancement of performance of a conductive wire in a multilayered substrate
IBM0 citations51