P

Inventor

SATOH TAKAMI

JP20 patents

Patents

20 patents
US5505781AApr 9, 1996

Hydrophobic processing apparatus including a liquid delivery system

TOKYO ELECTRON LTD64 citations96
US5518552AMay 21, 1996

Method for scrubbing and cleaning substrate

TOKYO ELECTRON LTD54 citations95
US5488964AFeb 6, 1996

Washing apparatus, and washing method

TOKYO ELECTRON LTD45 citations95
US5345639ASep 13, 1994

Device and method for scrubbing and cleaning substrate

TOKYO ELECTRON LTD67 citations95
US5887604AMar 30, 1999

Washing apparatus, and washing method

TOKYO ELECTRON LTD21 citations92
US5782990AJul 21, 1998

Method for washing objects

TOKYO ELECTRON LTD23 citations92
US5681614AOct 28, 1997

Hydrophobic treatment method involving delivery of a liquid process agent to a process space

TOKYO ELECTRON LTD31 citations92
US5671764ASep 30, 1997

Washing apparatus, and washing method

TOKYO ELECTRON LTD21 citations92
US5514852AMay 7, 1996

Heat treatment device

TOKYO ELECTRON LTD21 citations92
US9881799B2Jan 30, 2018

Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium

TOKYO ELECTRON LTD2 citations73
US9109934B2Aug 18, 2015

Solution processing apparatus, solution processing method, and non-transitory computer-readable recording medium

TOKYO ELECTRON LTD5 citations72
US10573539B2Feb 25, 2020

Substrate liquid processing apparatus

TOKYO ELECTRON LTD6 citations71
US10483137B2Nov 19, 2019

Substrate liquid processing apparatus, substrate liquid processing method, and storage medium

TOKYO ELECTRON LTD3 citations70
US10276408B2Apr 30, 2019

Flow-rate regulator device, diluted chemical-liquid supply device, liquid processing apparatus and its operating system

TOKYO ELECTRON LTD2 citations70
US10067514B2Sep 4, 2018

Substrate processing apparatus and liquid mixing method

TOKYO ELECTRON LTD4 citations69
US8054612B2Nov 8, 2011

Plug-in unit including a breaker and an electric device

TOKYO ELECTRON LTD2 citations55
US9631963B2Apr 25, 2017

Solution processing apparatus, solution processing method, and non-transitory computer-readable recording medium

TOKYO ELECTRON LTD0 citations51
US11433420B2Sep 6, 2022

Solution supply apparatus and solution supply method

TOKYO ELECTRON LTD0 citations45
US10714365B2Jul 14, 2020

Liquid processing apparatus

TOKYO ELECTRON LTD0 citations45
US9887092B2Feb 6, 2018

Etching method, etching apparatus, and storage medium

TOKYO ELECTRON LTD0 citations36