Inventor
ANAI NORIYUKI
JP26 patents
Patents
26 patentsUS5061144AOct 29, 1991
Resist process apparatus
TOKYO ELECTRON LTD183 citations99
US5919520AJul 6, 1999
Coating method and apparatus for semiconductor process
TOKYO ELECTRON LTD105 citations98
US6749688B2Jun 15, 2004
Coating method and apparatus for semiconductor process
TOKYO ELECTRON LTD47 citations96
US5688322ANov 18, 1997
Apparatus for coating resist on substrate
TOKYO ELECTRON LTD89 citations96
US5505781AApr 9, 1996
Hydrophobic processing apparatus including a liquid delivery system
TOKYO ELECTRON LTD64 citations96
US5089305AFeb 18, 1992
Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state
TOKYO ELECTRON LTD74 citations96
US5002008AMar 26, 1991
Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state
TOKYO ELECTRON LTD115 citations96
US5518552AMay 21, 1996
Method for scrubbing and cleaning substrate
TOKYO ELECTRON LTD54 citations95
US5488964AFeb 6, 1996
Washing apparatus, and washing method
TOKYO ELECTRON LTD45 citations95
US5345639ASep 13, 1994
Device and method for scrubbing and cleaning substrate
TOKYO ELECTRON LTD67 citations95
US6635113B2Oct 21, 2003
Coating apparatus and coating method
TOKYO ELECTRON LTD31 citations92
US6458208B1Oct 1, 2002
Film forming apparatus
TOKYO ELECTRON LTD40 citations92
US6451515B2Sep 17, 2002
Substrate treating method
TOKYO ELECTRON LTD31 citations92
US6443641B2Sep 3, 2002
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD28 citations92
US6261007B1Jul 17, 2001
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD43 citations92
US6165552ADec 26, 2000
Film forming method
TOKYO ELECTRON LTD41 citations92
US6079428AJun 27, 2000
Apparatus for removing coated film from peripheral portion of substrate
TOKYO ELECTRON LTD34 citations92
US5887604AMar 30, 1999
Washing apparatus, and washing method
TOKYO ELECTRON LTD21 citations92
US5782990AJul 21, 1998
Method for washing objects
TOKYO ELECTRON LTD23 citations92
US5681614AOct 28, 1997
Hydrophobic treatment method involving delivery of a liquid process agent to a process space
TOKYO ELECTRON LTD31 citations92
US5671764ASep 30, 1997
Washing apparatus, and washing method
TOKYO ELECTRON LTD21 citations92
US5028955AJul 2, 1991
Exposure apparatus
TOKYO ELECTRON LTD36 citations92
US6270576B1Aug 7, 2001
Coating and developing apparatus
TOKYO ELECTRON LTD24 citations89
US6444409B2Sep 3, 2002
Coating and developing method
TOKYO ELECTRON LTD9 citations71
USD415184SOct 12, 1999
Apparatus for manufacturing a semiconductor for a liquid crystal display
TOKYO ELECTRON LTD15 citations71
USD415776SOct 26, 1999
Apparatus for manufacturing a semiconductor for a liquid crystal display
TOKYO ELECTRON LTD5 citations60