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Inventor

HAWTHORNE RICHARD C

US16 patents
⚠️ This page may combine multiple inventors who share the name “HAWTHORNE RICHARD C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

15 patents
US5783495AJul 21, 1998

Method of wafer cleaning, and system and cleaning solution regarding same

MICRON TECHNOLOGY INC173 citations99
US6235145B1May 22, 2001

System for wafer cleaning

MICRON TECHNOLOGY INC110 citations98
US6207587B1Mar 27, 2001

Method for forming a dielectric

MICRON TECHNOLOGY INC78 citations96
US5990019ANov 23, 1999

Selective etching of oxides

MICRON TECHNOLOGY INC58 citations95
US5685951ANov 11, 1997

Methods and etchants for etching oxides of silicon with low selectivity in a vapor phase system

MICRON TECHNOLOGY INC53 citations95
US6029680AFeb 29, 2000

Method for in situ removal of particulate residues resulting from cleaning treatments

MICRON TECHNOLOGY INC23 citations92
US5928969AJul 27, 1999

Method for controlled selective polysilicon etching

MICRON TECHNOLOGY INC34 citations92
US5770263AJun 23, 1998

Method for in situ removal of particulate residues resulting from hydrofluoric acid cleaning treatments

MICRON TECHNOLOGY INC20 citations92
US5749975AMay 12, 1998

Process for dry cleaning wafer surfaces using a surface diffusion layer

MICRON TECHNOLOGY INC40 citations92
US5716535AFeb 10, 1998

Methods and etchants for etching oxides of silicon with low selectivity

MICRON TECHNOLOGY INC33 citations92
US5785875AJul 28, 1998

Photoresist removal process using heated solvent vapor

MICRON TECHNOLOGY INC29 citations91
US6399504B1Jun 4, 2002

Methods and etchants for etching oxides of silicon with low selectivity

MICRON TECHNOLOGY INC5 citations74
US6010949AJan 4, 2000

Method for removing silicon nitride in the fabrication of semiconductor devices

MICRON TECHNOLOGY INC8 citations70
US6432841B1Aug 13, 2002

Method for forming a dielectric

MICRON TECHNOLOGY INC2 citations63
US6210489B1Apr 3, 2001

Methods and etchants for etching oxides of silicon with low selectivity

MICRON TECHNOLOGY INC2 citations63

MICRON SEMICONDUCTOR INC

1 patent