Inventor
PAN PAI HUNG
US110 patents
⚠️ This page may combine multiple inventors who share the name “PAN PAI HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
45 patentsUS6309975B1Oct 30, 2001
Methods of making implanted structures
MICRON TECHNOLOGY INC83 citations99
US6261964B1Jul 17, 2001
Material removal method for forming a structure
MICRON TECHNOLOGY INC309 citations99
US6191037B1Feb 20, 2001
Methods, apparatuses and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes
MICRON TECHNOLOGY INC185 citations99
US5925918AJul 20, 1999
Gate stack with improved sidewall integrity
MICRON TECHNOLOGY INC136 citations99
US5739066AApr 14, 1998
Semiconductor processing methods of forming a conductive gate and line
MICRON TECHNOLOGY INC103 citations99
US6514842B1Feb 4, 2003
Low resistance gate flash memory
MICRON TECHNOLOGY INC104 citations98
US6436818B1Aug 20, 2002
Semiconductor structure having a doped conductive layer
MICRON TECHNOLOGY INC114 citations98
US6362086B2Mar 26, 2002
Forming a conductive structure in a semiconductor device
MICRON TECHNOLOGY INC108 citations98
US6288419B1Sep 11, 2001
Low resistance gate flash memory
MICRON TECHNOLOGY INC103 citations98
US6198144B1Mar 6, 2001
Passivation of sidewalls of a word line stack
MICRON TECHNOLOGY INC97 citations98
US6075274AJun 13, 2000
Semiconductor devices having gate stack with improved sidewall integrity
MICRON TECHNOLOGY INC91 citations98
US6015997AJan 18, 2000
Semiconductor structure having a doped conductive layer
MICRON TECHNOLOGY INC87 citations98
US6599840B2Jul 29, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC54 citations96
US6461967B2Oct 8, 2002
Material removal method for forming a structure
MICRON TECHNOLOGY INC44 citations96
US6429496B1Aug 6, 2002
Ion-assisted oxidation methods and the resulting structures
MICRON TECHNOLOGY INC38 citations96
US6395620B1May 28, 2002
Method for forming a planar surface over low density field areas on a semiconductor wafer
MICRON TECHNOLOGY INC70 citations96
US6355580B1Mar 12, 2002
Ion-assisted oxidation methods and the resulting structures
MICRON TECHNOLOGY INC25 citations96
US6291868B1Sep 18, 2001
Forming a conductive structure in a semiconductor device
MICRON TECHNOLOGY INC76 citations96
US6259127B1Jul 10, 2001
Integrated circuit container having partially rugged surface
MICRON TECHNOLOGY INC41 citations96
US6057200AMay 2, 2000
Method of making a field effect transistor having an elevated source and an elevated drain
MICRON TECHNOLOGY INC38 citations96
US5998290ADec 7, 1999
Method to protect gate stack material during source/drain reoxidation
MICRON TECHNOLOGY INC84 citations96
US5854127ADec 29, 1998
Method of forming a contact landing pad
MICRON TECHNOLOGY INC53 citations96
US5834358ANov 10, 1998
Isolation regions and methods of forming isolation regions
MICRON TECHNOLOGY INC71 citations96
US5801413ASep 1, 1998
Container-shaped bottom electrode for integrated circuit capacitor with partially rugged surface
MICRON TECHNOLOGY INC55 citations96
US5736455AApr 7, 1998
Method for passivating the sidewalls of a tungsten word line
MICRON TECHNOLOGY INC69 citations96
US5637518AJun 10, 1997
Method of making a field effect transistor having an elevated source and an elevated drain
MICRON TECHNOLOGY INC37 citations96
US6770538B2Aug 3, 2004
Ion-assisted oxidation methods and the resulting structures
MICRON TECHNOLOGY INC15 citations93
US6744108B1Jun 1, 2004
Doped silicon diffusion barrier region
MICRON TECHNOLOGY INC14 citations93
US6593616B2Jul 15, 2003
Buried bit line memory circuitry
MICRON TECHNOLOGY INC14 citations93
US6423620B2Jul 23, 2002
Semiconductor processing methods of forming contact openings, methods of forming memory circuitry, methods of forming electrical connections, and methods of forming dynamic random access memory dram circuitry
MICRON TECHNOLOGY INC23 citations93
US6391756B1May 21, 2002
Semiconductor processing methods of forming contact openings
MICRON TECHNOLOGY INC15 citations93
US6337274B1Jan 8, 2002
Methods of forming buried bit line memory circuitry
MICRON TECHNOLOGY INC21 citations93
US6322634B1Nov 27, 2001
Shallow trench isolation structure without corner exposure
MICRON TECHNOLOGY INC30 citations93
US6080645AJun 27, 2000
Method of making a doped silicon diffusion barrier region
MICRON TECHNOLOGY INC23 citations93
US6067680AMay 30, 2000
Semiconductor processing method of forming a conductively doped semiconductive material plug within a contact opening
MICRON TECHNOLOGY INC42 citations93
US6066544AMay 23, 2000
Isolation regions and methods of forming isolation regions
MICRON TECHNOLOGY INC19 citations93
US6027984AFeb 22, 2000
Method for growing oxide
MICRON TECHNOLOGY INC18 citations93
US5930641AJul 27, 1999
Method for forming an integrated circuit container having partially rugged surface
MICRON TECHNOLOGY INC35 citations93
US5763932AJun 9, 1998
Isolation regions and methods of forming isolation regions
MICRON TECHNOLOGY INC20 citations93
US5712186AJan 27, 1998
Method for growing field oxide to minimize birds' beak length
MICRON TECHNOLOGY INC34 citations93
US5677573AOct 14, 1997
Field effect transistor
MICRON TECHNOLOGY INC23 citations93
US6596595B1Jul 22, 2003
Forming a conductive structure in a semiconductor device
MICRON TECHNOLOGY INC16 citations92
US6596648B2Jul 22, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC27 citations92
US6596642B2Jul 22, 2003
Material removal method for forming a structure
MICRON TECHNOLOGY INC18 citations92
US6004879ADec 21, 1999
Method for fabricating a structure on a cobalt silicide oxide metalization semiconductor substrate
MICRON TECHNOLOGY INC23 citations92
IBM
5 patentsUS5330935AJul 19, 1994
Low temperature plasma oxidation process
IBM151 citations98
US5618751AApr 8, 1997
Method of making single-step trenches using resist fill and recess
IBM152 citations96
US5521422AMay 28, 1996
Corner protected shallow trench isolation device
IBM89 citations96
US5412246AMay 2, 1995
Low temperature plasma oxidation process
IBM93 citations96
US5434109AJul 18, 1995
Oxidation of silicon nitride in semiconductor devices
IBM76 citations95
Showing the top 50 of 110 patents by PatentIndex Score.