P

Inventor

TATEISHI HIDEKI

JP8 patents
⚠️ This page may combine multiple inventors who share the name “TATEISHI HIDEKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

5 patents
US4405435ASep 20, 1983

Apparatus for performing continuous treatment in vacuum

HITACHI LTD171 citations97
US4853102AAug 1, 1989

Sputtering process and an apparatus for carrying out the same

HITACHI LTD97 citations96
US4610770ASep 9, 1986

Method and apparatus for sputtering

HITACHI LTD86 citations96
US4675096AJun 23, 1987

Continuous sputtering apparatus

HITACHI LTD58 citations95
US4401539AAug 30, 1983

Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure

HITACHI LTD90 citations95

TOKYO ELECTRON LTD

1 patent
US7709394B2May 4, 2010

Substrate processing method and apparatus fabrication process of a semiconductor device

TOKYO ELECTRON LTD2 citations62

EBARA CORP

1 patent
US8357284B2Jan 22, 2013

Method for forming metal film

EBARA CORP0 citations50

TATEISHI HIDEKI

1 patent
US8205625B2Jun 26, 2012

Apparatus and method for surface treatment of substrate, and substrate processing apparatus and method

TATEISHI HIDEKI0 citations43