Inventor
PARK YOUNG-KYOU
KR13 patents
Patents
13 patentsUS6953739B2Oct 11, 2005
Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps
SAMSUNG ELECTRONICS CO LTD17 citations92
US6074486AJun 13, 2000
Apparatus and method for manufacturing a semiconductor device having hemispherical grains
SAMSUNG ELECTRONICS CO LTD53 citations92
US5821152AOct 13, 1998
Methods of forming hemispherical grained silicon electrodes including multiple temperature steps
SAMSUNG ELECTRONICS CO LTD29 citations92
US5842690ADec 1, 1998
Semiconductor wafer anchoring device
SAMSUNG ELECTRONICS CO LTD40 citations89
US7208878B2Apr 24, 2007
Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode
SAMSUNG ELECTRONICS CO LTD13 citations82
US7119489B2Oct 10, 2006
Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode
SAMSUNG ELECTRONICS CO LTD12 citations82
US6312987B1Nov 6, 2001
Method for manufacturing semiconductor device having hemispherical grain polysilicon film
SAMSUNG ELECTRONICS CO LTD15 citations82
US6090188AJul 18, 2000
Air intake apparatus of chemical vapor deposition equipment and method for removing ozone using the same
SAMSUNG ELECTRONICS CO LTD18 citations77
US6673673B1Jan 6, 2004
Method for manufacturing a semiconductor device having hemispherical grains
SAMSUNG ELECTRONICS CO LTD11 citations73
US6723215B2Apr 20, 2004
Sputtering apparatus for forming a metal film using a magnetic field
SAMSUNG ELECTRONICS CO LTD3 citations61
US7109132B2Sep 19, 2006
High density plasma chemical vapor deposition process
SAMSUNG ELECTRONICS CO LTD2 citations59
US6683010B1Jan 27, 2004
Method for forming silicon-oxynitride layer on semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations54
US7268853B2Sep 11, 2007
Exposing systems providing post exposure baking and related methods
SAMSUNG ELECTRONICS CO LTD5 citations53