Inventor
BALUSWAMY PARY
US17 patents
⚠️ This page may combine multiple inventors who share the name “BALUSWAMY PARY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
15 patentsUS6432591B1Aug 13, 2002
Overlay target design method with pitch determination to minimize impact of lens aberrations
MICRON TECHNOLOGY INC14 citations92
US6675053B2Jan 6, 2004
Layout for measurement of overlay error
MICRON TECHNOLOGY INC21 citations91
US6484060B1Nov 19, 2002
Layout for measurement of overlay error
MICRON TECHNOLOGY INC31 citations91
US7268869B2Sep 11, 2007
In-situ spectrograph and method of measuring light wavelength characteristics for photolithography
MICRON TECHNOLOGY INC15 citations83
US6822342B2Nov 23, 2004
Raised-lines overlay semiconductor targets and method of making the same
MICRON TECHNOLOGY INC14 citations83
US7223674B2May 29, 2007
Methods for forming backside alignment markers useable in semiconductor lithography
MICRON TECHNOLOGY INC7 citations73
US6914017B1Jul 5, 2005
Residue free overlay target
MICRON TECHNOLOGY INC10 citations73
US6756167B2Jun 29, 2004
Overlay target design method to minimize impact of lens aberrations
MICRON TECHNOLOGY INC4 citations73
US7790338B2Sep 7, 2010
Optical compensation devices, systems, and methods
MICRON TECHNOLOGY INC5 citations72
US6514643B2Feb 4, 2003
Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrations
MICRON TECHNOLOGY INC1 citations62
US7862964B2Jan 4, 2011
Methods for photo-processing photo-imageable material
MICRON TECHNOLOGY INC0 citations51
US7767363B2Aug 3, 2010
Methods for photo-processing photo-imageable material
MICRON TECHNOLOGY INC0 citations51
US7105278B2Sep 12, 2006
Pattern mask with features to minimize the effect of aberrations
MICRON TECHNOLOGY INC0 citations51
US6803157B2Oct 12, 2004
Pattern mask with features to minimize the effect of aberrations
MICRON TECHNOLOGY INC1 citations51
US7655384B2Feb 2, 2010
Methods for reducing spherical aberration effects in photolithography
MICRON TECHNOLOGY INC0 citations41