Inventor
KAWASAKI YOSHINAO
JP52 patents
⚠️ This page may combine multiple inventors who share the name “KAWASAKI YOSHINAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
49 patentsUS5855726AJan 5, 1999
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD407 citations99
US4795529AJan 3, 1989
Plasma treating method and apparatus therefor
HITACHI LTD184 citations97
US6519504B1Feb 11, 2003
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD45 citations96
US5868854AFeb 9, 1999
Method and apparatus for processing samples
HITACHI LTD67 citations96
US5780882AJul 14, 1998
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD33 citations96
US5432315AJul 11, 1995
Plasma process apparatus including ground electrode with protection film
HITACHI LTD68 citations96
US5331191AJul 19, 1994
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD24 citations96
US5276386AJan 4, 1994
Microwave plasma generating method and apparatus
HITACHI LTD66 citations96
US5202275AApr 13, 1993
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD43 citations96
US5007981AApr 16, 1991
Method of removing residual corrosive compounds by plasma etching followed by washing
HITACHI LTD106 citations96
US5646489AJul 8, 1997
Plasma generator with mode restricting means
HITACHI LTD43 citations93
US5433789AJul 18, 1995
Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves
HITACHI LTD22 citations93
US6537415B2Mar 25, 2003
Apparatus for processing samples
HITACHI LTD17 citations92
US5804033ASep 8, 1998
Microwave plasma processing method and apparatus
HITACHI LTD32 citations92
US5520771AMay 28, 1996
Microwave plasma processing apparatus
HITACHI LTD28 citations92
US5290993AMar 1, 1994
Microwave plasma processing device
HITACHI LTD42 citations92
US5200017AApr 6, 1993
Sample processing method and apparatus
HITACHI LTD38 citations92
US4936967AJun 26, 1990
Method of detecting an end point of plasma treatment
HITACHI LTD30 citations92
US5085750AFeb 4, 1992
Plasma treating method and apparatus therefor
HITACHI LTD34 citations91
US4911812AMar 27, 1990
Plasma treating method and apparatus therefor
HITACHI LTD47 citations90
US6548847B2Apr 15, 2003
Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film
HITACHI LTD12 citations82
US6342412B1Jan 29, 2002
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD8 citations82
US6188935B1Feb 13, 2001
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD9 citations82
US6169324B1Jan 2, 2001
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD13 citations82
US6127255AOct 3, 2000
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD8 citations82
US5811316ASep 22, 1998
Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring
HITACHI LTD8 citations82
US5739589AApr 14, 1998
Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same
HITACHI LTD13 citations82
US7347656B2Mar 25, 2008
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD3 citations74
US6752579B2Jun 22, 2004
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD7 citations74
US6752580B2Jun 22, 2004
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD3 citations74
US6705828B2Mar 16, 2004
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD11 citations74
US6672819B1Jan 6, 2004
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD7 citations74
US6526330B2Feb 25, 2003
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD5 citations74
US6253117B1Jun 26, 2001
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD3 citations74
US6165377ADec 26, 2000
Plasma etching method and apparatus
HITACHI LTD9 citations74
US6046425AApr 4, 2000
Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber
HITACHI LTD10 citations74
US5952245ASep 14, 1999
Method for processing samples
HITACHI LTD7 citations74
US5900162AMay 4, 1999
Plasma etching method and apparatus
HITACHI LTD12 citations74
US5557147ASep 17, 1996
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD7 citations74
US6537417B2Mar 25, 2003
Apparatus for processing samples
HITACHI LTD6 citations73
US6254721B1Jul 3, 2001
Method and apparatus for processing samples
HITACHI LTD6 citations73
US6036816AMar 14, 2000
Apparatus for processing a sample having a metal laminate
HITACHI LTD8 citations73
US5914051AJun 22, 1999
Microwave plasma processing method and apparatus
HITACHI LTD10 citations73
US5785807AJul 28, 1998
Microwave plasma processing method and apparatus
HITACHI LTD11 citations73
US6962472B2Nov 8, 2005
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD1 citations63
US6895685B2May 24, 2005
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD1 citations63
US6077788AJun 20, 2000
Method and apparatus for processing samples
HITACHI LTD5 citations63
US6989228B2Jan 24, 2006
Method and apparatus for processing samples
HITACHI LTD3 citations62
US7201551B2Apr 10, 2007
Vacuum processing apparatus and semiconductor manufacturing line using the same
HITACHI LTD0 citations52
HITACHI VLSI ENG
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