Inventor

SHANNON STEVEN C

US38 patents

⚠️ This page may combine multiple inventors who share the name “SHANNON STEVEN C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHANNON STEVEN C

APPLIED MATERIALS INC

Method of plasma load impedance tuning by modulation of an unmatched low power RF generator

Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources

Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity

Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator

Method of plasma confinement for enhancing magnetic control of plasma radial distribution

Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output

Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks

Method for determining plasma characteristics

Inductive antenna for a plasma reactor producing reduced fluorine dissociation

Plasma generation and control using a dual frequency RF source

Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator

Plasma reactor with reduced electrical skew using electrical bypass elements

Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor

Dual frequency RF match

Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources

Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes

Method for testing plasma reactor multi-frequency impedance match networks

Methods and apparatus for controlling characteristics of a plasma

Apparatus and method to confine plasma and reduce flow resistance in a plasma

Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor

Plasma generation and control using dual frequency RF signals

Method for monitoring process drift using plasma characteristics

Plasma control using dual cathode frequency mixing

Apparatus for multiple frequency power application

Method for determining plasma characteristics

Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources

Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output

Method for determining plasma characteristics

SHANNON STEVEN C

Magnetic confinement of a plasma

Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator

Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator

Apparatus for multiple frequency power application

COLLINS KENNETH S

Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes

Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator

(unassigned)

Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber

MEHTA VINEET

Substrate cleaning chamber and cleaning and conditioning methods

APPLIED MARTERIALS INC

Matching network characterization using variable impedance analysis

UNIV NORTH CAROLINA STATE

Very high frequency (VHF) driven atmospheric plasma sources and point of use fertigation of irrigation water utilizing plasma production of nitrogen bearing species