Inventor
HAYANO KATSUYA
JP34 patents
⚠️ This page may combine multiple inventors who share the name “HAYANO KATSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
18 patentsUS6329112B1Dec 11, 2001
Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens
HITACHI LTD59 citations96
US5895741AApr 20, 1999
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system
HITACHI LTD59 citations96
US5429896AJul 4, 1995
Photomask and pattern forming method employing the same
HITACHI LTD58 citations96
US6632744B2Oct 14, 2003
Manufacturing method of semiconductor integrated circuit device
HITACHI LTD17 citations93
US6403413B2Jun 11, 2002
Manufacturing method of semiconductor integrated circuit device having a capacitor
HITACHI LTD26 citations93
US6225011B1May 1, 2001
Method for manufacturing semiconductor devices utilizing plurality of exposure systems
HITACHI LTD38 citations92
US5700601ADec 23, 1997
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system
HITACHI LTD40 citations92
US6548312B1Apr 15, 2003
Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods
HITACHI LTD31 citations91
US7736985B2Jun 15, 2010
Method for manufacturing semiconductor device using overlapping exposure and semiconductor device thereof
HITACHI LTD13 citations84
US7387867B2Jun 17, 2008
Manufacturing method of semiconductor integrated circuit device
HITACHI LTD12 citations84
US5578421ANov 26, 1996
Photomask and pattern forming method employing the same
HITACHI LTD10 citations82
US6706452B2Mar 16, 2004
Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
HITACHI LTD9 citations74
US5851703ADec 22, 1998
Photomask and pattern forming method employing the same
HITACHI LTD6 citations74
US5656400AAug 12, 1997
Photomask and pattern forming method employing the same
HITACHI LTD7 citations74
US6258513B1Jul 10, 2001
Photomask and pattern forming method employing the same
HITACHI LTD1 citations63
US6087074AJul 11, 2000
Photomask and pattern forming method employing the same
HITACHI LTD2 citations63
US6013398AJan 11, 2000
Photomask and pattern forming method employing the same
HITACHI LTD2 citations63
US6383718B2May 7, 2002
Photomask and pattern forming method employing the same
HITACHI LTD0 citations52
RENESAS TECH CORP
8 patentsUS6713231B1Mar 30, 2004
Method of manufacturing semiconductor integrated circuit devices
RENESAS TECH CORP27 citations93
US7001712B2Feb 21, 2006
Manufacturing method of semiconductor integrated circuit device
RENESAS TECH CORP13 citations84
US6824958B2Nov 30, 2004
Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
RENESAS TECH CORP8 citations74
US6750496B2Jun 15, 2004
Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device
RENESAS TECH CORP5 citations63
US6841399B2Jan 11, 2005
Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device
RENESAS TECH CORP3 citations59
US7172853B2Feb 6, 2007
Method of manufacturing semiconductor integrated circuit devices
RENESAS TECH CORP1 citations52
US7115344B2Oct 3, 2006
Photomask and pattern forming method employing the same
RENESAS TECH CORP0 citations52
US6733953B2May 11, 2004
Photomask and pattern forming method employing the same
RENESAS TECH CORP0 citations52
DAINIPPON PRINTING CO LTD
7 patentsUS7252910B2Aug 7, 2007
Fabrication method of semiconductor integrated circuit device and mask fabrication method
DAINIPPON PRINTING CO LTD19 citations92
US10394118B2Aug 27, 2019
Photomask and methods for manufacturing and correcting photomask
DAINIPPON PRINTING CO LTD2 citations72
US10048580B2Aug 14, 2018
Photomask and methods for manufacturing and correcting photomask
DAINIPPON PRINTING CO LTD2 citations72
US9519211B2Dec 13, 2016
Photomask and methods for manufacturing and correcting photomask
DAINIPPON PRINTING CO LTD2 citations61
US10634990B2Apr 28, 2020
Photomask and methods for manufacturing and correcting photomask
DAINIPPON PRINTING CO LTD0 citations51
US9971238B2May 15, 2018
Mask blank, phase shift mask, and production method thereof
DAINIPPON PRINTING CO LTD1 citations46
US9874808B2Jan 23, 2018
Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same
DAINIPPON PRINTING CO LTD0 citations46