Inventor

RAJARATNAM MARTHA M

US8 patents

⚠️ This page may combine multiple inventors who share the name “RAJARATNAM MARTHA M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIPLEY CO

3 patents

US5344742ASep 6, 1994

Benzyl-substituted photoactive compounds and photoresist compositions comprising same

SHIPLEY CO78 citations94

US5258257ANov 2, 1993

Radiation sensitive compositions comprising polymer having acid labile groups

SHIPLEY CO51 citations94

US5362600ANov 8, 1994

Radiation sensitive compositions comprising polymer having acid labile groups

SHIPLEY CO27 citations90

ADVANCED TECH MATERIALS

2 patents

US7922824B2Apr 12, 2011

Oxidizing aqueous cleaner for the removal of post-etch residues

ADVANCED TECH MATERIALS57 citations97

US9443713B2Sep 13, 2016

Oxidizing aqueous cleaner for the removal of post-etch residues

ADVANCED TECH MATERIALS2 citations62

SHIPLEY CO LLC

2 patents

US6048672AApr 11, 2000

Photoresist compositions and methods and articles of manufacture comprising same

SHIPLEY CO LLC61 citations96

US5731364AMar 24, 1998

Photoimageable compositions comprising multiple arylsulfonium photoactive compounds

SHIPLEY CO LLC70 citations95

MINSEK DAVID W

1 patent

US8765654B2Jul 1, 2014

Oxidizing aqueous cleaner for the removal of post-etch residues

MINSEK DAVID W5 citations82