Inventor
WANG HSINGYA ARTHUR
US35 patents
⚠️ This page may combine multiple inventors who share the name “WANG HSINGYA ARTHUR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
13 patentsUS5656513AAug 12, 1997
Nonvolatile memory cell formed using self aligned source implant
ADVANCED MICRO DEVICES INC80 citations95
US5776811AJul 7, 1998
Simplified process for fabricating flash eeprom cells
ADVANCED MICRO DEVICES INC25 citations93
US5831901ANov 3, 1998
Method of programming a memory cell to contain multiple values
ADVANCED MICRO DEVICES INC21 citations91
US5763307AJun 9, 1998
Block select transistor and method of fabrication
ADVANCED MICRO DEVICES INC39 citations90
US5981364ANov 9, 1999
Method of forming a silicon gate to produce silicon devices with improved performance
ADVANCED MICRO DEVICES INC10 citations74
US5899726AMay 4, 1999
Method of forming oxide isolation in a semiconductor device
ADVANCED MICRO DEVICES INC8 citations74
US5908318AJun 1, 1999
Method of forming low capacitance interconnect structures on semiconductor substrates
ADVANCED MICRO DEVICES INC10 citations72
US5728453AMar 17, 1998
Method of fabricating topside structure of a semiconductor device
ADVANCED MICRO DEVICES INC6 citations67
US5882985AMar 16, 1999
Reduction of field oxide step height during semiconductor fabrication
ADVANCED MICRO DEVICES INC3 citations63
US5747882AMay 5, 1998
Device including means for preventing tungsten silicide lifting, and method of fabrication thereof
ADVANCED MICRO DEVICES INC4 citations63
US5866467AFeb 2, 1999
Method of improving oxide isolation in a semiconductor device
ADVANCED MICRO DEVICES INC0 citations52
US5818082AOct 6, 1998
E2 PROM device having erase gate in oxide isolation region in shallow trench and method of manufacture thereof
ADVANCED MICRO DEVICES INC0 citations52
US5989938ANov 23, 1999
Method of fabricating topside structure of a semiconductor device
ADVANCED MICRO DEVICES INC0 citations44
HYUNDAI ELECTRONICS AMERICA
7 patentsUS6169693B1Jan 2, 2001
Self-convergence of post-erase threshold voltages in a flash memory cell using transient response
HYUNDAI ELECTRONICS AMERICA122 citations96
US6026026AFeb 15, 2000
Self-convergence of post-erase threshold voltages in a flash memory cell using transient response
HYUNDAI ELECTRONICS AMERICA125 citations96
US6525970B2Feb 25, 2003
Erase method for flash memory
HYUNDAI ELECTRONICS AMERICA21 citations92
US6347054B1Feb 12, 2002
Method of operating flash memory
HYUNDAI ELECTRONICS AMERICA17 citations92
US6043123AMar 28, 2000
Triple well flash memory fabrication process
HYUNDAI ELECTRONICS AMERICA38 citations92
US7154141B2Dec 26, 2006
Source side programming
HYUNDAI ELECTRONICS AMERICA16 citations82
US5920506AJul 6, 1999
Method and apparatus for bulk preprogramming flash memory cells with minimal source and drain currents
HYUNDAI ELECTRONICS AMERICA15 citations71
HYNIX SEMICONDUCTOR INC
7 patentsUS6812515B2Nov 2, 2004
Polysilicon layers structure and method of forming same
HYNIX SEMICONDUCTOR INC33 citations92
US6746906B2Jun 8, 2004
Transistor with ultra-short gate feature and method of fabricating the same
HYNIX SEMICONDUCTOR INC23 citations92
US7202134B2Apr 10, 2007
Method of forming transistors with ultra-short gate feature
HYNIX SEMICONDUCTOR INC5 citations74
US7160774B2Jan 9, 2007
Method of forming polysilicon layers in non-volatile memory
HYNIX SEMICONDUCTOR INC6 citations74
US6849489B2Feb 1, 2005
Method for forming transistors with ultra-short gate feature
HYNIX SEMICONDUCTOR INC8 citations74
US6911370B2Jun 28, 2005
Flash memory device having poly spacers
HYNIX SEMICONDUCTOR INC3 citations63
US7250341B2Jul 31, 2007
Flash memory device having poly spacers
HYNIX SEMICONDUCTOR INC0 citations52
HYNIX SEMICONDUCTOR AMERICA INC
4 patentsUS6559008B2May 6, 2003
Non-volatile memory cells with selectively formed floating gate
HYNIX SEMICONDUCTOR AMERICA INC59 citations95
US6818504B2Nov 16, 2004
Processes and structures for self-aligned contact non-volatile memory with peripheral transistors easily modifiable for various technologies and applications
HYNIX SEMICONDUCTOR AMERICA INC40 citations92
US6777741B2Aug 17, 2004
Non-volatile memory cells with selectively formed floating gate
HYNIX SEMICONDUCTOR AMERICA INC22 citations92
US6509237B2Jan 21, 2003
Flash memory cell fabrication sequence
HYNIX SEMICONDUCTOR AMERICA INC3 citations56