Inventor

LEVINSON HARRY J

US60 patents

⚠️ This page may combine multiple inventors who share the name “LEVINSON HARRY J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEVINSON HARRY J

ADVANCED MICRO DEVICES INC

Selective photoresist hardening to facilitate lateral trimming

Method and apparatus for reducing biological contamination in an immersion lithography system

Pellicle for use in EUV lithography and a method of making such a pellicle

Method using a thin resist mask for dual damascene stop layer etch

System for controlling reflection reticle temperature in microlithography

Ultra-thin resist and nitride/oxide hard mask for metal etch

Extreme ultraviolet (EUV) lithography masks

Thin resist with transition metal hard mask for via etch application

Thin resist with nitride hard mask for gate etch application

Thin resist with amorphous silicon hard mask for via etch application

Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films

Ultra-thin resist and SiON/oxide hard mask for metal etch

Ultra-thin resist and barrier metal/oxide hard mask for metal etch

Ultra-thin resist and oxide/nitride hard mask for metal etch

Thin resist with transition metal hard mask for via etch application

Ultra-thin resist and silicon/oxide hard mask for metal etch

Method for transferring patterns created by lithography

Thin resist with nitride hard mask for via etch application

Method and apparatus for wafer-focusing

Attenuated phase shift mask for use in EUV lithography and a method of making such a mask

EUV mask or reticle having reduced reflections

Inspection system for the pupil of a lithographic tool

Mark protection scheme with no masking

Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems

Differential wavelength inspection system

Pellicle for use in small wavelength lithography and a method for making such a pellicle

Method of and system for improving stability of photomasks

Via in a planarized dielectric and process for producing same

Ultra-thin resist shallow trench process using high selectivity nitride etch

Method and system for improving transmission of light through photomasks

Method for measuring lens imaging uniformity

Polished hard mask process for conductor layer patterning

GLOBALFOUNDRIES INC

Methods of generating circuit layouts that are to be manufactured using SADP routing techniques and virtual non-mandrel mask rules

Middle of-line architecture for dense library layout using M0 hand-shake

Cut mask aware contact enclosure rule for grating and cut patterning solution

MOL architecture enabling ultra-regular cross couple

Mask-aware routing and resulting device

Self-aligned double patterning via enclosure design

Methods of design rule checking of circuit designs

Methods of generating circuit layouts that are to be manufactured using SADP routing techniques

Pellicle with aerogel support frame

Self-aligned double patterning process for metal routing

Methods of generating circuit layouts that are to be manufactured using SADP techniques

Method and system for detecting existence of an undesirable particle during semiconductor fabrication

Stabilization of deep ultraviolet photoresist

LEVINSON HARRY J

Method for semiconductor wafer fabrication utilizing a cleaning substrate

YUAN LEI

Methods of forming contacts for semiconductor devices using a local interconnect processing scheme

OKOROANYANWU UZODINMA

Method for forming a high resolution resist pattern on a semiconductor wafer