Inventor

YANG CHIH YUH

US70 patents

⚠️ This page may combine multiple inventors who share the name “YANG CHIH YUH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG CHIH YUH

ADVANCED MICRO DEVICES INC

Epitaxially grown fin for FinFET

Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning

Method for forming fins in a FinFET device using sacrificial carbon layer

Method for forming a fin in a finFET device

Integrated plasma etch of gate and gate dielectric and low power plasma post gate etch removal of high-K residual

Process for fabricating a semiconductor device component using a selective silicidation reaction

Method using a thin resist mask for dual damascene stop layer etch

Ultra-thin resist and nitride/oxide hard mask for metal etch

Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance

CVD silicon carbide layer as a BARC and hard mask for gate patterning

Gate array with multiple dielectric properties and method for forming same

Thin resist with transition metal hard mask for via etch application

Thin resist with nitride hard mask for gate etch application

Thin resist with amorphous silicon hard mask for via etch application

Epitaxially grown fin for FinFET

Self aligned damascene gate

Semiconductor device having a gate structure surrounding a fin

CVD organic polymer film for advanced gate patterning

Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices

Process for fabrication of a transistor gate including high-K gate dielectric with in-situ resist trim, gate etch, and high-K dielectric removal

Etch stop layer for etching FinFET gate over a large topography

Process for reducing the critical dimensions of integrated circuit device features

Process for forming sub-lithographic photoresist features by modification of the photoresist surface

Process for preventing deformation of patterned photoresist features

In-situ gate etch process for fabrication of a narrow gate transistor structure with a high-k gate dielectric

Ultra-thin resist and SiON/oxide hard mask for metal etch

Ultra-thin resist and barrier metal/oxide hard mask for metal etch

Method for shaping photoresist mask to improve high aspect ratio ion implantation

Ultra-thin resist and oxide/nitride hard mask for metal etch

Thin resist with transition metal hard mask for via etch application

Ultra-thin resist and silicon/oxide hard mask for metal etch

Method for transferring patterns created by lithography

Thin resist with nitride hard mask for via etch application

Spacers with a graded dielectric constant for semiconductor devices having a high-K dielectric

Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication

Integrated circuit fabrication critical dimension control using self-limiting resist etch

Silicon oxime spacer for preventing over-etching during local interconnect formation

Controlled linewidth reduction during gate pattern formation using an SiON BARC

Controlled linewidth reduction during gate pattern formation using a spin-on barc

Process for fabricating a semiconductor device component by oxidizing a silicon hard mask

Process for fabricating a metal semiconductor device component by lateral oxidization

Enhanced transistor gate using E-beam radiation

Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology

Methods for forming small contacts

Method for patterning a feature using a trimmed hardmask

Treatment of dielectric material to enhance etch rate

Method for semiconductor gate line dimension reduction

Method for reducing gate line deformation and reducing gate line widths in semiconductor devices

Ultra-thin resist shallow trench process using high selectivity nitride etch

SPANSION LLC

Methods for fabricating dual bit flash memory devices