P

Inventor

STANTON WILLIAM

CA28 patents
⚠️ This page may combine multiple inventors who share the name “STANTON WILLIAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

16 patents
US6120952ASep 19, 2000

Methods of reducing proximity effects in lithographic processes

MICRON TECHNOLOGY INC155 citations97
US6238824B1May 29, 2001

Method for designing and making photolithographic reticle, reticle, and photolithographic process

MICRON TECHNOLOGY INC71 citations93
US6418008B1Jul 9, 2002

Enhanced capacitor shape

MICRON TECHNOLOGY INC17 citations92
US6376130B1Apr 23, 2002

Chromeless alternating reticle for producing semiconductor device features

MICRON TECHNOLOGY INC22 citations92
US6258489B1Jul 10, 2001

Mask design utilizing dummy features

MICRON TECHNOLOGY INC37 citations92
US6319644B2Nov 20, 2001

Methods of reducing proximity effects in lithographic processes

MICRON TECHNOLOGY INC29 citations91
US6284419B2Sep 4, 2001

Methods of reducing proximity effects in lithographic processes

MICRON TECHNOLOGY INC29 citations91
US6844118B2Jan 18, 2005

Method and layout for high density reticle

MICRON TECHNOLOGY INC6 citations74
US6369432B1Apr 9, 2002

Enhanced capacitor shape

MICRON TECHNOLOGY INC11 citations74
US7932003B2Apr 26, 2011

Methods of forming and using reticles

MICRON TECHNOLOGY INC2 citations63
US7930657B2Apr 19, 2011

Methods of forming photomasks

MICRON TECHNOLOGY INC1 citations63
US7754395B2Jul 13, 2010

Methods of forming and using reticles

MICRON TECHNOLOGY INC4 citations63
US6391709B1May 21, 2002

Enhanced capacitor shape

MICRON TECHNOLOGY INC1 citations63
US6372639B1Apr 16, 2002

Method for constructing interconnects for sub-micron semiconductor devices and the resulting semiconductor devices

MICRON TECHNOLOGY INC4 citations63
US8589826B2Nov 19, 2013

Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures

MICRON TECHNOLOGY INC0 citations52
US8365101B2Jan 29, 2013

Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures

MICRON TECHNOLOGY INC0 citations52

SPLUNK INC

4 patents

SYNOPSYS INC

2 patents

SATCON TECHNOLOGY CORP

1 patent

SATCON TECHNOLOGY INC

1 patent

(unassigned)

1 patent

TETRAD DESIGN GROUP INC

1 patent

MICHAELS HERBERT

1 patent

SHIFT PRODUCTS LTD

1 patent