Inventor
SHIGAKI SHUHEI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “SHIGAKI SHUHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NISSAN CHEMICAL IND LTD
13 patentsUS9627217B2Apr 18, 2017
Silicon-containing EUV resist underlayer film-forming composition including additive
NISSAN CHEMICAL IND LTD2 citations71
US10613440B2Apr 7, 2020
Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate
NISSAN CHEMICAL IND LTD1 citations62
US10558119B2Feb 11, 2020
Composition for coating resist pattern
NISSAN CHEMICAL IND LTD1 citations62
US9337052B2May 10, 2016
Silicon-containing EUV resist underlayer film forming composition
NISSAN CHEMICAL IND LTD2 citations61
US11479627B2Oct 25, 2022
Film forming composition containing fluorine-containing surfactant
NISSAN CHEMICAL IND LTD0 citations60
US11459414B2Oct 4, 2022
Film forming composition containing fluorine-containing surfactant
NISSAN CHEMICAL IND LTD0 citations60
US10082735B2Sep 25, 2018
Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure
NISSAN CHEMICAL IND LTD1 citations52
US10508174B2Dec 17, 2019
Silicon-containing coating agent for reversing planarization pattern
NISSAN CHEMICAL IND LTD0 citations51
US9632414B2Apr 25, 2017
Coating liquid to be applied to resist pattern and method for forming reverse pattern
NISSAN CHEMICAL IND LTD0 citations51
US9834745B2Dec 5, 2017
Cleaning fluid for semiconductor, and cleaning method using the same
NISSAN CHEMICAL IND LTD0 citations48
US10133178B2Nov 20, 2018
Coating liquid for resist pattern coating
NISSAN CHEMICAL IND LTD0 citations41
US10025191B2Jul 17, 2018
Polymer-containing coating liquid applied to resist pattern
NISSAN CHEMICAL IND LTD0 citations41
US9290623B2Mar 22, 2016
Composition for forming silicon-containing resist underlayer film having cyclic diester group
NISSAN CHEMICAL IND LTD0 citations41
NISSAN CHEMICAL CORP
7 patentsUS11531269B2Dec 20, 2022
Method for producing resist pattern coating composition with use of solvent replacement method
NISSAN CHEMICAL CORP0 citations62
US12084592B2Sep 10, 2024
Coating composition for pattern inversion
NISSAN CHEMICAL CORP0 citations51
US11609499B2Mar 21, 2023
Silicon-containing coating agent for pattern reversal
NISSAN CHEMICAL CORP0 citations51
US10910220B2Feb 2, 2021
Planarization method for a semiconductor substrate using a silicon-containing composition
NISSAN CHEMICAL CORP0 citations51
US12493243B2Dec 9, 2025
Film-forming composition
NISSAN CHEMICAL CORP0 citations50
US12585188B2Mar 24, 2026
Composition for forming resist underlying film
NISSAN CHEMICAL CORP0 citations49
US12372875B2Jul 29, 2025
Composition for resist pattern metallization process
NISSAN CHEMICAL CORP0 citations49
SAMSUNG ELECTRONICS CO LTD
2 patentsUS12517432B2Jan 6, 2026
Substrate treating composition and method for fabricating a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11215927B2Jan 4, 2022
Substrate treating composition and method for fabricating a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations62