Inventor
KENDALL RODNEY A
US21 patents
⚠️ This page may combine multiple inventors who share the name “KENDALL RODNEY A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
17 patentsUS6724001B1Apr 20, 2004
Electron beam lithography apparatus with self actuated vacuum bypass valve
IBM79 citations97
US5532903AJul 2, 1996
Membrane electrostatic chuck
IBM54 citations96
US5508518AApr 16, 1996
Lithography tool with vibration isolation
IBM58 citations96
US5981962ANov 9, 1999
Distributed direct write lithography system using multiple variable shaped electron beams
IBM76 citations95
US5140242AAug 18, 1992
Servo guided stage system
IBM71 citations95
US6175122B1Jan 16, 2001
Method for writing a pattern using multiple variable shaped electron beams
IBM57 citations92
US5962859AOct 5, 1999
Multiple variable shaped electron beam system with lithographic structure
IBM28 citations92
US5585629ADec 17, 1996
Electron beam nano-metrology system
IBM36 citations92
US5059090AOct 22, 1991
Two-dimensional positioning apparatus
IBM53 citations92
US6091187AJul 18, 2000
High emittance electron source having high illumination uniformity
IBM19 citations90
US5434424AJul 18, 1995
Spinning reticle scanning projection lithography exposure system and method
IBM19 citations82
US5052844AOct 1, 1991
Ball joint with dynamic preload adjustment
IBM20 citations82
US6028662AFeb 22, 2000
Adjustment of particle beam landing angle
IBM12 citations73
US6369396B1Apr 9, 2002
Calibration target for electron beams
IBM2 citations62
US6639219B2Oct 28, 2003
Electron scatter in a thin membrane to eliminate detector saturation
IBM0 citations51
US6818906B1Nov 16, 2004
Electron beam position reference system
IBM1 citations48
US6908255B2Jun 21, 2005
Remote clamping mechanism via vacuum feedthrough
IBM1 citations45
NIKON CORP
4 patentsUS6414313B1Jul 2, 2002
Multiple numerical aperture electron beam projection lithography system
NIKON CORP15 citations84
US6483117B1Nov 19, 2002
Symmetric blanking for high stability in electron beam exposure systems
NIKON CORP13 citations72
US6588090B1Jul 8, 2003
Fabrication method of high precision, thermally stable electromagnetic coil vanes
NIKON CORP4 citations54
US6596999B2Jul 22, 2003
High performance source for electron beam projection lithography
NIKON CORP1 citations52