P

Inventor

KATSUNUMA TAKAYUKI

JP39 patents
⚠️ This page may combine multiple inventors who share the name “KATSUNUMA TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

34 patents
US8703002B2Apr 22, 2014

Plasma processing apparatus, plasma processing method and storage medium

TOKYO ELECTRON LTD343 citations98
US10090191B2Oct 2, 2018

Selective plasma etching method of a first region containing a silicon atom and an oxygen atom

TOKYO ELECTRON LTD39 citations94
US10923360B2Feb 16, 2021

Method of etching film and plasma processing apparatus

TOKYO ELECTRON LTD6 citations84
US11664236B2May 30, 2023

Method of etching film and plasma processing apparatus

TOKYO ELECTRON LTD2 citations73
US10811274B2Oct 20, 2020

Etching method and plasma processing apparatus

TOKYO ELECTRON LTD3 citations73
US9396962B2Jul 19, 2016

Etching method

TOKYO ELECTRON LTD3 citations71
US9735027B2Aug 15, 2017

Method for etching organic film

TOKYO ELECTRON LTD3 citations70
US12588447B2Mar 24, 2026

Etching method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US12354837B2Jul 8, 2025

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US12334343B2Jun 17, 2025

Substrate processing method and substrate processing system

TOKYO ELECTRON LTD0 citations62
US12334331B2Jun 17, 2025

Substrate processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US12154792B2Nov 26, 2024

Plasma etching method

TOKYO ELECTRON LTD0 citations62
US11955337B2Apr 9, 2024

Substrate processing method and substrate processing system

TOKYO ELECTRON LTD0 citations62
US11955316B2Apr 9, 2024

Substrate processing method, method for manufacturing semiconducor device, and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US11501975B2Nov 15, 2022

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations62
US11417527B2Aug 16, 2022

Method and device for controlling a thickness of a protective film on a substrate

TOKYO ELECTRON LTD0 citations62
US11114304B2Sep 7, 2021

Substrate processing method

TOKYO ELECTRON LTD0 citations62
US10916442B2Feb 9, 2021

Etching method

TOKYO ELECTRON LTD1 citations62
US9087676B2Jul 21, 2015

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD2 citations62
US11637003B2Apr 25, 2023

Method for etching film and plasma processing apparatus

TOKYO ELECTRON LTD0 citations61
US11476123B2Oct 18, 2022

Etching method, plasma processing apparatus, and substrate processing system

TOKYO ELECTRON LTD0 citations60
US12112954B2Oct 8, 2024

Etching method, substrate processing apparatus, and substrate processing system

TOKYO ELECTRON LTD1 citations59
US11443954B2Sep 13, 2022

Method and apparatus for controlling a shape of a pattern over a substrate

TOKYO ELECTRON LTD0 citations52
US11264236B2Mar 1, 2022

Substrate processing method

TOKYO ELECTRON LTD0 citations52
US10854430B2Dec 1, 2020

Plasma etching method

TOKYO ELECTRON LTD0 citations52
US10854470B2Dec 1, 2020

Plasma etching method

TOKYO ELECTRON LTD0 citations52
US9899232B2Feb 20, 2018

Etching method

TOKYO ELECTRON LTD0 citations52
US9330930B2May 3, 2016

Plasma etching method and semiconductor device manufacturing method

TOKYO ELECTRON LTD1 citations52
US9881806B2Jan 30, 2018

Method of manufacturing a semiconductor device

TOKYO ELECTRON LTD0 citations51
US9318340B2Apr 19, 2016

Method of manufacturing a semiconductor device

TOKYO ELECTRON LTD0 citations51
US9147580B2Sep 29, 2015

Plasma etching method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations50
US10541147B2Jan 21, 2020

Etching method

TOKYO ELECTRON LTD0 citations42
US9460897B2Oct 4, 2016

Plasma etching method and plasma etching apparatus

TOKYO ELECTRON LTD0 citations41
US7189653B2Mar 13, 2007

Etching method and etching apparatus

TOKYO ELECTRON LTD0 citations41

TERUMO CORP

3 patents

KUBOTA KAZUHIRO

1 patent

WATANABE SEIICHI

1 patent