Inventor
SATAKE MAKOTO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “SATAKE MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
11 patentsUS7133165B2Nov 7, 2006
Image reading device, method of controlling the same, control program, storage medium and image forming apparatus provided with the image reading device
CANON KK18 citations92
US7395957B2Jul 8, 2008
Image processing apparatus
CANON KK9 citations83
US7295338B2Nov 13, 2007
Status information acquisition from plural functions included in image processing apparatus
CANON KK10 citations80
US7551330B2Jun 23, 2009
Image reading device, method of controlling the same, control program, storage medium and image forming apparatus provided with the image reading device
CANON KK7 citations74
US6049597AApr 11, 2000
Data communication system between a personal computer and facsimile machine through an interface
CANON KK15 citations73
US11790199B2Oct 17, 2023
Printing apparatus, control method, and storage medium
CANON KK0 citations62
US6896351B1May 24, 2005
Image recording apparatus, image processing apparatus and method of controlling the same
CANON KK4 citations62
US7029086B2Apr 18, 2006
Image-forming apparatus and method for controlling the same
CANON KK2 citations61
US8373891B2Feb 12, 2013
Image-forming apparatus and method for controlling the same
CANON KK0 citations51
US7448711B2Nov 11, 2008
Image-forming apparatus and method for controlling the same
CANON KK0 citations51
US7180639B2Feb 20, 2007
Image communication apparatus
CANON KK0 citations51
HITACHI HIGH TECH CORP
6 patentsUS11094509B2Aug 17, 2021
Plasma processing apparatus
HITACHI HIGH TECH CORP2 citations71
US9097754B2Aug 4, 2015
Method of manufacturing magnetoresistive element
HITACHI HIGH TECH CORP2 citations63
US10796884B2Oct 6, 2020
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations61
US12581881B2Mar 17, 2026
Plasma processing method
HITACHI HIGH TECH CORP0 citations56
US12347693B2Jul 1, 2025
Plasma processing method and manufacturing method of semiconductor device
HITACHI HIGH TECH CORP0 citations52
US10243140B2Mar 26, 2019
Manufacturing method of magnetoresistive element and vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations42