Inventor
BORDEN PETER G
US59 patents
⚠️ This page may combine multiple inventors who share the name “BORDEN PETER G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
15 patentsUS7026175B2Apr 11, 2006
High throughput measurement of via defects in interconnects
APPLIED MATERIALS INC137 citations95
US6906801B2Jun 14, 2005
Measuring a property of a layer in multilayered structure
APPLIED MATERIALS INC19 citations93
US6958814B2Oct 25, 2005
Apparatus and method for measuring a property of a layer in a multilayered structure
APPLIED MATERIALS INC21 citations92
US6940592B2Sep 6, 2005
Calibration as well as measurement on the same workpiece during fabrication
APPLIED MATERIALS INC51 citations91
US7547569B2Jun 16, 2009
Method for patterning Mo layer in a photovoltaic device comprising CIGS material using an etch process
APPLIED MATERIALS INC8 citations84
US7465591B2Dec 16, 2008
Evaluating a geometric or material property of a multilayered structure
APPLIED MATERIALS INC14 citations84
US7078711B2Jul 18, 2006
Matching dose and energy of multiple ion implanters
APPLIED MATERIALS INC16 citations84
US7379185B2May 27, 2008
Evaluation of openings in a dielectric layer
APPLIED MATERIALS INC11 citations83
US7190458B2Mar 13, 2007
Use of scanning beam for differential evaluation of adjacent regions for change in reflectivity
APPLIED MATERIALS INC11 citations83
US7301619B2Nov 27, 2007
Evaluating a multi-layered structure for voids
APPLIED MATERIALS INC6 citations73
US7141440B2Nov 28, 2006
Apparatus and method for measuring a property of a layer in a multilayered structure
APPLIED MATERIALS INC7 citations73
US7136163B2Nov 14, 2006
Differential evaluation of adjacent regions for change in reflectivity
APPLIED MATERIALS INC7 citations73
US7064822B2Jun 20, 2006
Evaluating a multi-layered structure for voids
APPLIED MATERIALS INC8 citations73
US6885458B2Apr 26, 2005
Apparatus and method for determining the active dopant profile in a semiconductor wafer
APPLIED MATERIALS INC4 citations73
US7130055B2Oct 31, 2006
Use of coefficient of a power curve to evaluate a semiconductor wafer
APPLIED MATERIALS INC10 citations71
BOXER CROSS INC
14 patentsUS6323951B1Nov 27, 2001
Apparatus and method for determining the active dopant profile in a semiconductor wafer
BOXER CROSS INC93 citations98
US6054868AApr 25, 2000
Apparatus and method for measuring a property of a layer in a multilayered structure
BOXER CROSS INC94 citations98
US6049220AApr 11, 2000
Apparatus and method for evaluating a wafer of semiconductor material
BOXER CROSS INC151 citations98
US6154280ANov 28, 2000
System and method for measuring the microroughness of a surface of a substrate
BOXER CROSS INC64 citations96
US5966019AOct 12, 1999
System and method for measuring properties of a semiconductor substrate in a fabrication line
BOXER CROSS INC81 citations96
US5883518AMar 16, 1999
System and method for measuring the doping level and doping profile of a region in a semiconductor substrate
BOXER CROSS INC61 citations96
US5877860AMar 2, 1999
System and method for measuring the microroughness of a surface of a substrate
BOXER CROSS INC70 citations96
US6483594B2Nov 19, 2002
Apparatus and method for determining the active dopant profile in a semiconductor wafer
BOXER CROSS INC51 citations95
US6426644B1Jul 30, 2002
Apparatus and method for determining the active dopant profile in a semiconductor wafer
BOXER CROSS INC47 citations95
US6971791B2Dec 6, 2005
Identifying defects in a conductive structure of a wafer, based on heat transfer therethrough
BOXER CROSS INC46 citations92
US6885444B2Apr 26, 2005
Evaluating a multi-layered structure for voids
BOXER CROSS INC14 citations92
US6812047B1Nov 2, 2004
Evaluating a geometric or material property of a multilayered structure
BOXER CROSS INC41 citations92
US6911349B2Jun 28, 2005
Evaluating sidewall coverage in a semiconductor wafer
BOXER CROSS INC16 citations84
US6812717B2Nov 2, 2004
Use of a coefficient of a power curve to evaluate a semiconductor wafer
BOXER CROSS INC11 citations71
HIGH YIELD TECHNOLOGY
14 patentsUS5424558AJun 13, 1995
Apparatus and a method for dynamically tuning a particle sensor in response to varying process conditions
HIGH YIELD TECHNOLOGY96 citations94
US4896048AJan 23, 1990
Scattering-type particle detection device for use in high temperature process chambers
HIGH YIELD TECHNOLOGY23 citations93
US4783599ANov 8, 1988
Particle detector for flowing liquids with the ability to distinguish bubbles via photodiodes disposed 180° apart
HIGH YIELD TECHNOLOGY37 citations93
US5347138ASep 13, 1994
In situ real time particle monitor for a sputter coater chamber
HIGH YIELD TECHNOLOGY35 citations92
US5436465AJul 25, 1995
Modular particle monitor for vacuum process equipment
HIGH YIELD TECHNOLOGY31 citations89
US5360980ANov 1, 1994
Structure and method for providing a gas purge for a vacuum particle sensor installed in a corrosive or coating environment
HIGH YIELD TECHNOLOGY25 citations87
US4792199ADec 20, 1988
System for detection of extremely small particles in a low pressure environment
HIGH YIELD TECHNOLOGY19 citations82
US4894529AJan 16, 1990
Real-time particle counter for liquids with nebulizer and dryer
HIGH YIELD TECHNOLOGY19 citations80
US5247188ASep 21, 1993
Concentrator funnel for vacuum line particle monitors
HIGH YIELD TECHNOLOGY10 citations74
US4812664AMar 14, 1989
Apparatus for scanning a flat surface to detect defects
HIGH YIELD TECHNOLOGY15 citations74
US5606418AFeb 25, 1997
Quasi bright field particle sensor
HIGH YIELD TECHNOLOGY10 citations73
US5235625AAug 10, 1993
Method for synchronizing particle counters to external events
HIGH YIELD TECHNOLOGY16 citations70
US5534706AJul 9, 1996
Particle monitor for throttled pumping systems
HIGH YIELD TECHNOLOGY17 citations68
US5212580AMay 18, 1993
Low cost stage for raster scanning of semiconductor wafers
HIGH YIELD TECHNOLOGY10 citations67
VARIAN ASSOCIATES
3 patents(unassigned)
1 patentBORDEN PETER G
1 patentPORTHOUSE KEITH BRIAN
1 patentFISHER PIERCE CO
1 patentShowing the top 50 of 59 patents by PatentIndex Score.