Inventor

YERUSHALMI LIRAN

IL25 patents

⚠️ This page may combine multiple inventors who share the name “YERUSHALMI LIRAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YERUSHALMI LIRAN

KLA TENCOR CORP

Measurement of overlay error using device inspection system

Metrology targets with supplementary structures in an intermediate layer

Device metrology targets and methods

Overlay control with non-zero offset prediction

Optimizing the utilization of metrology tools

Device-like metrology targets

Misregistration measurements using combined optical and electron beam technology

Device metrology targets and methods

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Recipe optimization based zonal analysis

Measurement of overlay error using device inspection system

Reducing device overlay errors

Lithography systems with integrated metrology tools having enhanced functionalities

Optimizing the utilization of metrology tools

KLA CORP

Device-like overlay metrology targets displaying Moiré effects

Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices

Self-calibrating overlay metrology

System and method for error reduction for metrology measurements

Systems and methods for feedforward process control in the manufacture of semiconductor devices

Measurement of properties of patterned photoresist

Self-calibrating overlay metrology

Self-calibrated overlay metrology using a skew training sample

Inter-step feedforward process control in the manufacture of semiconductor devices

Systems and methods for improved metrology for semiconductor device wafers