Inventor
TAKEKUMA TAKASHI
JP18 patents
Patents
18 patentsUS6054181AApr 25, 2000
Method of substrate processing to form a film on multiple target objects
TOKYO ELECTRON LTD106 citations98
US5964954AOct 12, 1999
Double-sided substrate cleaning apparatus and cleaning method using the same
TOKYO ELECTRON LTD119 citations98
US5580607ADec 3, 1996
Coating apparatus and method
TOKYO ELECTRON LTD104 citations98
US5565034AOct 15, 1996
Apparatus for processing substrates having a film formed on a surface of the substrate
TOKYO ELECTRON LTD216 citations98
US5518542AMay 21, 1996
Double-sided substrate cleaning apparatus
TOKYO ELECTRON LTD265 citations98
US6402400B1Jun 11, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD60 citations96
US5725664AMar 10, 1998
Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections
TOKYO ELECTRON LTD87 citations95
US6848625B2Feb 1, 2005
Process liquid supply mechanism and process liquid supply method
TOKYO ELECTRON LTD58 citations94
US6527861B2Mar 4, 2003
Developing apparatus with a porous film nozzle
TOKYO ELECTRON LTD24 citations92
US6432199B1Aug 13, 2002
Apparatus and method for processing a substrate
TOKYO ELECTRON LTD49 citations92
US6377329B1Apr 23, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD52 citations92
US6284043B1Sep 4, 2001
Solution treatment apparatus
TOKYO ELECTRON LTD39 citations92
US6258167B1Jul 10, 2001
Process liquid film forming apparatus
TOKYO ELECTRON LTD41 citations92
US5686143ANov 11, 1997
Resist treating method
TOKYO ELECTRON LTD31 citations92
US5416047AMay 16, 1995
Method for applying process solution to substrates
TOKYO ELECTRON LTD42 citations92
US5070813ADec 10, 1991
Coating apparatus
TOKYO ELECTRON LTD42 citations91
US5665200ASep 9, 1997
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD36 citations89
US7485188B2Feb 3, 2009
Coating process method and coating process apparatus
TOKYO ELECTRON LTD9 citations81