Inventor
LEE HEON
KR64 patents
⚠️ This page may combine multiple inventors who share the name “LEE HEON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HEWLETT PACKARD DEVELOPMENT CO
24 patentsUS6743368B2Jun 1, 2004
Nano-size imprinting stamp using spacer technique
HEWLETT PACKARD DEVELOPMENT CO82 citations98
US6746892B2Jun 8, 2004
Low heat loss and small contact area composite electrode for a phase change media memory device
HEWLETT PACKARD DEVELOPMENT CO101 citations97
US6755984B2Jun 29, 2004
Micro-casted silicon carbide nano-imprinting stamp
HEWLETT PACKARD DEVELOPMENT CO49 citations96
US6605821B1Aug 12, 2003
Phase change material electronic memory structure and method for forming
HEWLETT PACKARD DEVELOPMENT CO322 citations95
US6759180B2Jul 6, 2004
Method of fabricating sub-lithographic sized line and space patterns for nano-imprinting lithography
HEWLETT PACKARD DEVELOPMENT CO38 citations93
US7080596B2Jul 25, 2006
Micro-casted silicon carbide nano-imprinting stamp
HEWLETT PACKARD DEVELOPMENT CO23 citations92
US6916511B2Jul 12, 2005
Method of hardening a nano-imprinting stamp
HEWLETT PACKARD DEVELOPMENT CO23 citations92
US6537846B2Mar 25, 2003
Substrate bonding using a selenidation reaction
HEWLETT PACKARD DEVELOPMENT CO26 citations92
US7462292B2Dec 9, 2008
Silicon carbide imprint stamp
HEWLETT PACKARD DEVELOPMENT CO14 citations84
US6984530B2Jan 10, 2006
Method of fabricating a MRAM device
HEWLETT PACKARD DEVELOPMENT CO17 citations84
US6576318B2Jun 10, 2003
Method to fabricate smooth-surfaced crystalline phase-change layer for atomic resolution storage device
HEWLETT PACKARD DEVELOPMENT CO14 citations80
US6989327B2Jan 24, 2006
Forming a contact in a thin-film device
HEWLETT PACKARD DEVELOPMENT CO8 citations74
US6839271B1Jan 4, 2005
Magnetic memory device
HEWLETT PACKARD DEVELOPMENT CO7 citations74
US6673714B2Jan 6, 2004
Method of fabricating a sub-lithographic sized via
HEWLETT PACKARD DEVELOPMENT CO8 citations74
US6984862B2Jan 10, 2006
Storage device with charge trapping structure and methods
HEWLETT PACKARD DEVELOPMENT CO6 citations73
US6664193B2Dec 16, 2003
Device isolation process flow for ARS system
HEWLETT PACKARD DEVELOPMENT CO5 citations73
US6927092B2Aug 9, 2005
Method of forming a shared global word line MRAM structure
HEWLETT PACKARD DEVELOPMENT CO5 citations69
US7259062B2Aug 21, 2007
Method of making a magnetic tunnel junction device
HEWLETT PACKARD DEVELOPMENT CO4 citations63
US7186571B2Mar 6, 2007
Method of fabricating a compositionally modulated electrode in a magnetic tunnel junction device
HEWLETT PACKARD DEVELOPMENT CO2 citations63
US7102921B2Sep 5, 2006
Magnetic memory device
HEWLETT PACKARD DEVELOPMENT CO4 citations63
US7060625B2Jun 13, 2006
Imprint stamp
HEWLETT PACKARD DEVELOPMENT CO5 citations63
US6998662B2Feb 14, 2006
Method of making a magnetic tunnel junction device
HEWLETT PACKARD DEVELOPMENT CO2 citations63
US6937506B2Aug 30, 2005
Magnetic memory device
HEWLETT PACKARD DEVELOPMENT CO6 citations63
US7709882B2May 4, 2010
Storage device with charge trapping structure and methods
HEWLETT PACKARD DEVELOPMENT CO3 citations62
INFINEON TECHNOLOGIES AG
8 patentsUS6355520B1Mar 12, 2002
Method for fabricating 4F2 memory cells with improved gate conductor structure
INFINEON TECHNOLOGIES AG73 citations96
US6294436B1Sep 25, 2001
Method for fabrication of enlarged stacked capacitors using isotropic etching
INFINEON TECHNOLOGIES AG34 citations93
US6261924B1Jul 17, 2001
Maskless process for self-aligned contacts
INFINEON TECHNOLOGIES AG32 citations93
US6362033B1Mar 26, 2002
Self-aligned LDD formation with one-step implantation for transistor formation
INFINEON TECHNOLOGIES AG13 citations74
US6352934B1Mar 5, 2002
Sidewall oxide process for improved shallow junction formation in support region
INFINEON TECHNOLOGIES AG8 citations74
US7153781B2Dec 26, 2006
Method to etch poly Si gate stacks with raised STI structure
INFINEON TECHNOLOGIES AG4 citations63
US6838339B2Jan 4, 2005
Area-efficient stack capacitor
INFINEON TECHNOLOGIES AG4 citations63
US6573192B1Jun 3, 2003
Dual thickness gate oxide fabrication method using plasma surface treatment
INFINEON TECHNOLOGIES AG4 citations63
IBM
4 patentsUS6440793B1Aug 27, 2002
Vertical MOSFET
IBM70 citations96
US6284666B1Sep 4, 2001
Method of reducing RIE lag for deep trench silicon etching
IBM87 citations95
US6414347B1Jul 2, 2002
Vertical MOSFET
IBM31 citations93
US6326260B1Dec 4, 2001
Gate prespacers for high density, high performance DRAMs
IBM16 citations83
SAMSUNG ELECTRONICS CO LTD
3 patentsUS9076549B2Jul 7, 2015
Semiconductor memory device and refresh method thereof
SAMSUNG ELECTRONICS CO LTD9 citations82
US9129702B2Sep 8, 2015
Method of refreshing volatile memory device
SAMSUNG ELECTRONICS CO LTD9 citations80
US7522446B2Apr 21, 2009
Heating MRAM cells to ease state switching
SAMSUNG ELECTRONICS CO LTD7 citations74
HYUNDAI MOTOR CO LTD
2 patentsHEWLETT PACKARD CO
2 patentsUS6440820B1Aug 27, 2002
Process flow for ARS mover using selenidation wafer bonding after processing a media side of a rotor wafer
HEWLETT PACKARD CO16 citations83
US6436794B1Aug 20, 2002
Process flow for ARS mover using selenidation wafer bonding before processing a media side of a rotor wafer
HEWLETT PACKARD CO18 citations83
HEWLETT PACKARD DEV COMPANY LL
1 patentHEWLETT PACKARD COMPANY L P
1 patentLUCENT TECHNOLOGIES INC
1 patentHEWLETT PACKARD DEVELPOMENT CO
1 patentLG ELECTRONICS INC
1 patentINFINEON TECHNOLOGOIES NORTH A
1 patentHUNETPLUS CO LTD
1 patentShowing the top 50 of 64 patents by PatentIndex Score.