Inventor
KAWATA SHINTARO
JP19 patents
⚠️ This page may combine multiple inventors who share the name “KAWATA SHINTARO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
18 patentsUS6087667AJul 11, 2000
Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source
NIKON CORP78 citations96
US6038015AMar 14, 2000
Electron-beam-projection-exposure apparatus with integrated mask inspection and cleaning portions
NIKON CORP85 citations96
US5396067AMar 7, 1995
Scan type electron microscope
NIKON CORP63 citations94
US5876881AMar 2, 1999
Manufacturing method for mask for charged-particle-beam transfer or mask for x-ray transfer
NIKON CORP26 citations92
US5798194AAug 25, 1998
Masks for charged-particle beam microlithography
NIKON CORP22 citations92
US5728492AMar 17, 1998
Mask for projection system using charged particle beam
NIKON CORP26 citations92
US6403971B1Jun 11, 2002
Beam-adjustment methods and apparatus for charged-particle-beam microlithography
NIKON CORP18 citations84
US6830852B2Dec 14, 2004
Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles
NIKON CORP7 citations74
US6657207B2Dec 2, 2003
Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures
NIKON CORP7 citations74
US6277542B1Aug 21, 2001
Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density
NIKON CORP11 citations74
US5969362AOct 19, 1999
High-throughput direct-write electron-beam exposure system and method
NIKON CORP15 citations74
US6620558B2Sep 16, 2003
Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion
NIKON CORP9 citations73
US6403268B1Jun 11, 2002
Reticles for charged-particle beam microlithography
NIKON CORP8 citations73
US6124718ASep 26, 2000
Charged-particle-beam projection-exposure apparatus with integrated reticle and substrate inspection
NIKON CORP14 citations73
US5563411AOct 8, 1996
Scanning photoelectron microscope
NIKON CORP13 citations71
US6894291B2May 17, 2005
Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system
NIKON CORP3 citations63
US5446282AAug 29, 1995
Scanning photoelectron microscope
NIKON CORP4 citations60
US6767691B2Jul 27, 2004
Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion
NIKON CORP0 citations52