Inventor
IIO AKIRA
JP13 patents
⚠️ This page may combine multiple inventors who share the name “IIO AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JAPAN SYNTHETIC RUBBER CO LTD
6 patentsUS5202388AApr 13, 1993
Process for producing hydrogenation product of ring-opening polymer
JAPAN SYNTHETIC RUBBER CO LTD56 citations94
US5053471AOct 1, 1991
Transparent resin material
JAPAN SYNTHETIC RUBBER CO LTD32 citations92
US5164469ANov 17, 1992
Transparent resin material
JAPAN SYNTHETIC RUBBER CO LTD21 citations79
US4246427AJan 20, 1981
Process for producing methacrylic acid
JAPAN SYNTHETIC RUBBER CO LTD8 citations71
US4036901AJul 19, 1977
Process for producing styrene
JAPAN SYNTHETIC RUBBER CO LTD13 citations71
US4039583AAug 2, 1977
Process for producing methacrolein
JAPAN SYNTHETIC RUBBER CO LTD3 citations62
TOSHIBA KK
4 patentsUS6740590B1May 25, 2004
Aqueous dispersion, aqueous dispersion for chemical mechanical polishing used for manufacture of semiconductor devices, method for manufacture of semiconductor devices, and method for formation of embedded writing
TOSHIBA KK102 citations98
US6454819B1Sep 24, 2002
Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device
TOSHIBA KK108 citations98
US6375545B1Apr 23, 2002
Chemical mechanical method of polishing wafer surfaces
TOSHIBA KK131 citations98
US6409780B1Jun 25, 2002
Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices
TOSHIBA KK4 citations62