Inventor

SEIDEL DIRK

DE23 patents

⚠️ This page may combine multiple inventors who share the name “SEIDEL DIRK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEIDEL DIRK

ZEISS CARL SMT GMBH

Method for localizing defects on substrates

Method for determining a position of a structure element on a mask and microscope for carrying out the method

Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process

Method for detecting an object structure and apparatus for carrying out the method

Method for capturing and compensating ambient effects in a measuring microscope

Device and method for measuring substrates for semiconductor lithography

Autofocusing method for an imaging device

Method for determining an imaging function of a mask inspection microscope, and mask inspection microscope

Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process

Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model

Method for determining the registration of a structure on a photomask and apparatus to perform the method

Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position

Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process

Method for ascertaining an image of an object

Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus

Method for correcting the distortion of a first imaging optical unit of a first measurement system

Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method therefor

Method and apparatus for determining the position of structure elements of a photolithographic mask

Method for ascertaining distortion properties of an optical system in a measurement system for microlithography

ARNZ MICHAEL

Method for determining the registration of a structure on a photomask and apparatus to perform the method

Determination of the relative position of two structures

PERLITZ SASCHA

Grating-assisted autofocus device and autofocusing method for an imaging device

SEIDEL DIRK

Method and apparatus for the position determination of structures on a mask for microlithography