Inventor

SUNG DOUGYONG

KR26 patents

⚠️ This page may combine multiple inventors who share the name “SUNG DOUGYONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUNG DOUGYONG

SAMSUNG ELECTRONICS CO LTD

Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same

Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the same

Electrostatic chucks and substrate processing apparatus including the same

Plasma etching method and semiconductor device fabrication method including the same

Method of plasma etching and method of fabricating semiconductor device using the same

Method of plasma etching and method of fabricating semiconductor device using the same

Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the same

Method of plasma etching and method of fabricating semiconductor device using the same

Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the same

Methods of fabricating semiconductor devices including performing an atomic layer etching process

Plasma processing apparatus

Plasma control apparatus and plasma processing system including the same

Electrostatic chucks and substrate processing apparatus including the same

Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same

Substrate processing apparatus, substrate processing method, and method of fabricating semiconductor device using the same

Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig

Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the same

Plasma etching method and semiconductor device fabrication method including the same

Apparatus for measuring radical density distribution based on light absorption and operating method thereof

Plasma sensor module

Substrate manufacturing method and substrate manufacturing apparatus

Plasma etching apparatus, plasma etching method, and semiconductor device fabrication method including the plasma etching method

Chuck assembly, fabrication system therewith, and method of fabricating semiconductor device using the same

Gas supply assembly and substrate processing apparatus including the same

Method of manufacturing semiconductor device

LAM RES CORP

Methods for silicon electrode assembly etch rate and etch uniformity recovery