Inventor
MATEJKA ULRICH
DE21 patents
⚠️ This page may combine multiple inventors who share the name “MATEJKA ULRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
14 patentsUS10068325B2Sep 4, 2018
Method for three-dimensionally measuring a 3D aerial image of a lithography mask
ZEISS CARL SMT GMBH10 citations82
US11079338B2Aug 3, 2021
Method for detecting a structure of a lithography mask and device for carrying out the method
ZEISS CARL SMT GMBH2 citations71
US10634886B2Apr 28, 2020
Method for three-dimensionally measuring a 3D aerial image of a lithography mask
ZEISS CARL SMT GMBH1 citations71
US10606048B2Mar 31, 2020
Imaging optical unit for a metrology system for examining a lithography mask
ZEISS CARL SMT GMBH3 citations71
US11892769B2Feb 6, 2024
Method for detecting an object structure and apparatus for carrying out the method
ZEISS CARL SMT GMBH2 citations70
US12572085B2Mar 10, 2026
Device and method for measuring substrates for semiconductor lithography
ZEISS CARL SMT GMBH0 citations62
US11796563B2Oct 24, 2023
Apparatus and method for a scanning probe microscope
ZEISS CARL SMT GMBH0 citations62
US11237185B2Feb 1, 2022
Apparatus and method for a scanning probe microscope
ZEISS CARL SMT GMBH1 citations62
US11112702B2Sep 7, 2021
Device and method for characterizing a microlithographic mask
ZEISS CARL SMT GMBH0 citations61
US11914303B2Feb 27, 2024
Apparatus and method for characterizing a microlithographic mask
ZEISS CARL SMT GMBH0 citations60
US10698318B2Jun 30, 2020
Method and device for characterizing a mask for microlithography
ZEISS CARL SMT GMBH1 citations59
US9535244B2Jan 3, 2017
Emulation of reproduction of masks corrected by local density variations
ZEISS CARL SMT GMBH0 citations51
US11029259B2Jun 8, 2021
Detection device for detecting a structure on an area portion of a lithography mask, and apparatus comprising a detection device of this type
ZEISS CARL SMT GMBH0 citations49
US11619882B2Apr 4, 2023
Method and apparatus for characterizing a microlithographic mask
ZEISS CARL SMT GMBH0 citations47
ZEISS CARL AG
3 patentsUS9904060B2Feb 27, 2018
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
ZEISS CARL AG5 citations82
US10168539B2Jan 1, 2019
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
ZEISS CARL AG3 citations71
US10578881B2Mar 3, 2020
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
ZEISS CARL AG0 citations50