Inventor
FUJIMOTO MASASHI
JP51 patents
⚠️ This page may combine multiple inventors who share the name “FUJIMOTO MASASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC ELECTRONICS CORP
13 patentsUS6573015B2Jun 3, 2003
Method of measuring optical aberration
NEC ELECTRONICS CORP17 citations92
US6613483B2Sep 2, 2003
Mask for measuring optical aberration and method of measuring optical aberration
NEC ELECTRONICS CORP14 citations84
US6841890B2Jan 11, 2005
Wafer alignment mark for image processing including rectangular patterns, image processing alignment method and method of manufacturing semiconductor device
NEC ELECTRONICS CORP9 citations74
US6670632B1Dec 30, 2003
Reticle and method of fabricating semiconductor device
NEC ELECTRONICS CORP12 citations74
US6645823B2Nov 11, 2003
Reticle and method of fabricating semiconductor device
NEC ELECTRONICS CORP6 citations74
US7776514B2Aug 17, 2010
Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
NEC ELECTRONICS CORP3 citations63
US7271906B2Sep 18, 2007
Image processing alignment method and method of manufacturing semiconductor device
NEC ELECTRONICS CORP2 citations63
US6835652B2Dec 28, 2004
Method of fabricating patterns with a dual damascene process
NEC ELECTRONICS CORP3 citations63
US6812155B2Nov 2, 2004
Pattern formation method
NEC ELECTRONICS CORP5 citations63
US6800402B2Oct 5, 2004
Phase-shifting mask and method of forming pattern using the same
NEC ELECTRONICS CORP3 citations63
US6580492B2Jun 17, 2003
Reticle system for measurement of effective coherence factors
NEC ELECTRONICS CORP6 citations63
US7537864B2May 26, 2009
Hole pattern design method and photomask
NEC ELECTRONICS CORP4 citations62
US7419767B2Sep 2, 2008
Phase-shifting mask and method of forming pattern using the same
NEC ELECTRONICS CORP0 citations52
NEC CORP
7 patentsUS6245585B1Jun 12, 2001
Method of providing levelling and focusing adjustments on a semiconductor wafer
NEC CORP29 citations92
US6517982B2Feb 11, 2003
Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same
NEC CORP6 citations74
US6449029B1Sep 10, 2002
Apparatus for providing levelling and focusing adjustments on a semiconductor wafer
NEC CORP7 citations74
US6048648AApr 11, 2000
Mask including optical shield layer having variable light transmittance
NEC CORP11 citations74
US6522389B2Feb 18, 2003
Scanning exposure photo-mask and method of scanning exposure and scanning exposure system
NEC CORP3 citations63
US6361903B1Mar 26, 2002
Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough
NEC CORP2 citations63
US6699626B2Mar 2, 2004
Mask set for use in phase shift photolithography technique which is suitable to form random patterns
NEC CORP1 citations52
PANASONIC AVIONICS CORP
6 patentsUSD753077SApr 5, 2016
Display system for seatback mounting
PANASONIC AVIONICS CORP36 citations97
USD812026SMar 6, 2018
Display device for seatback mounting
PANASONIC AVIONICS CORP18 citations94
USD850396SJun 4, 2019
Display system for seatback mounting
PANASONIC AVIONICS CORP14 citations93
USD819582SJun 5, 2018
Display system for seatback mounting
PANASONIC AVIONICS CORP26 citations93
USD773423SDec 6, 2016
Display system for seatback mounting
PANASONIC AVIONICS CORP15 citations92
US9788021B2Oct 10, 2017
Display system for a vehicle entertainment system
PANASONIC AVIONICS CORP9 citations82
KYOCERA MITA CORP
4 patentsUS7483665B2Jan 27, 2009
Fixing device
KYOCERA MITA CORP7 citations74
US7558518B2Jul 7, 2009
Fixing device for use in an image forming device
KYOCERA MITA CORP4 citations63
US7383009B2Jun 3, 2008
Fixing device for use in an image forming device
KYOCERA MITA CORP1 citations63
US7280794B2Oct 9, 2007
Fixing device for use in an image forming device
KYOCERA MITA CORP2 citations63
IDEC IZUMI CORP
2 patentsTOSHIBA CERAMICS CO
2 patentsJTEKT CORP
2 patentsRENESAS ELECTRONICS CORP
2 patentsMITSUBISHI MOTORS CORP
2 patentsFUJIMOTO MASASHI
2 patentsUS8617797B2Dec 31, 2013
Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
FUJIMOTO MASASHI0 citations47
US8192919B2Jun 5, 2012
Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
FUJIMOTO MASASHI0 citations47
OTSUKA TAIYOU
1 patentMITSUBISHI HEAVY IND LTD
1 patentTOSHIBA CERAMICS LTD
1 patentKAWAGUCHI KENICHI
1 patentBROTHER IND LTD
1 patentPANASONIC IP MAN CO LTD
1 patentMITSUBISHI AIRCRAFT CORP
1 patentSAITOU AKIYOSHI
1 patentShowing the top 50 of 51 patents by PatentIndex Score.