Inventor
TALWAR SOMIT
US34 patents
⚠️ This page may combine multiple inventors who share the name “TALWAR SOMIT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ULTRATECH STEPPER INC
22 patentsUS6747245B2Jun 8, 2004
Laser scanning apparatus and methods for thermal processing
ULTRATECH STEPPER INC190 citations99
US6635588B1Oct 21, 2003
Method for laser thermal processing using thermally induced reflectivity switch
ULTRATECH STEPPER INC287 citations99
US6479821B1Nov 12, 2002
Thermally induced phase switch for laser thermal processing
ULTRATECH STEPPER INC289 citations99
US6380044B1Apr 30, 2002
High-speed semiconductor transistor and selective absorption process forming same
ULTRATECH STEPPER INC95 citations98
US6365476B1Apr 2, 2002
Laser thermal process for fabricating field-effect transistors
ULTRATECH STEPPER INC125 citations98
US5908307AJun 1, 1999
Fabrication method for reduced-dimension FET devices
ULTRATECH STEPPER INC138 citations97
US5888888AMar 30, 1999
Method for forming a silicide region on a silicon body
ULTRATECH STEPPER INC122 citations97
US6645838B1Nov 11, 2003
Selective absorption process for forming an activated doped region in a semiconductor
ULTRATECH STEPPER INC60 citations96
US6495390B2Dec 17, 2002
Thermally induced reflectivity switch for laser thermal processing
ULTRATECH STEPPER INC38 citations96
US6383956B2May 7, 2002
Method of forming thermally induced reflectivity switch for laser thermal processing
ULTRATECH STEPPER INC61 citations96
US6303476B1Oct 16, 2001
Thermally induced reflectivity switch for laser thermal processing
ULTRATECH STEPPER INC62 citations96
US6300208B1Oct 9, 2001
Methods for annealing an integrated device using a radiant energy absorber layer
ULTRATECH STEPPER INC61 citations96
US6274488B1Aug 14, 2001
Method of forming a silicide region in a Si substrate and a device having same
ULTRATECH STEPPER INC79 citations96
US5956603ASep 21, 1999
Gas immersion laser annealing method suitable for use in the fabrication of reduced-dimension integrated circuits
ULTRATECH STEPPER INC83 citations96
US6420264B1Jul 16, 2002
Method of forming a silicide region in a Si substrate and a device having same
ULTRATECH STEPPER INC41 citations93
US6388297B1May 14, 2002
Structure and method for an optical block in shallow trench isolation for improved laser anneal control
ULTRATECH STEPPER INC20 citations93
US6326219B2Dec 4, 2001
Methods for determining wavelength and pulse length of radiant energy used for annealing
ULTRATECH STEPPER INC29 citations93
US6387803B2May 14, 2002
Method for forming a silicide region on a silicon body
ULTRATECH STEPPER INC37 citations92
US6297135B1Oct 2, 2001
Method for forming silicide regions on an integrated device
ULTRATECH STEPPER INC42 citations92
US6635541B1Oct 21, 2003
Method for annealing using partial absorber layer exposed to radiant energy and article made with partial absorber layer
ULTRATECH STEPPER INC29 citations91
US6570656B1May 27, 2003
Illumination fluence regulation system and method for use in thermal processing employed in the fabrication of reduced-dimension integrated circuits
ULTRATECH STEPPER INC48 citations91
US6777317B2Aug 17, 2004
Method for semiconductor gate doping
ULTRATECH STEPPER INC41 citations87
ULTRATECH INC
12 patentsUS7154066B2Dec 26, 2006
Laser scanning apparatus and methods for thermal processing
ULTRATECH INC81 citations98
US7098155B2Aug 29, 2006
Laser thermal annealing of lightly doped silicon substrates
ULTRATECH INC57 citations96
US7763828B2Jul 27, 2010
Laser thermal processing with laser diode radiation
ULTRATECH INC35 citations93
US7494942B2Feb 24, 2009
Laser thermal annealing of lightly doped silicon substrates
ULTRATECH INC22 citations93
US7399945B2Jul 15, 2008
Method of thermal processing a substrate with direct and redirected reflected radiation
ULTRATECH INC23 citations93
US7157660B2Jan 2, 2007
Laser scanning apparatus and methods for thermal processing
ULTRATECH INC30 citations93
US7145104B2Dec 5, 2006
Silicon layer for uniformizing temperature during photo-annealing
ULTRATECH INC24 citations93
US6825101B1Nov 30, 2004
Methods for annealing a substrate and article produced by such methods
ULTRATECH INC36 citations93
US7148159B2Dec 12, 2006
Laser thermal annealing of lightly doped silicon substrates
ULTRATECH INC31 citations92
US7879741B2Feb 1, 2011
Laser thermal annealing of lightly doped silicon substrates
ULTRATECH INC10 citations84
US7731798B2Jun 8, 2010
Heated chuck for laser thermal processing
ULTRATECH INC8 citations81
US7326877B2Feb 5, 2008
Laser thermal processing chuck with a thermal compensating heater module
ULTRATECH INC0 citations49