Inventor
UHLENBROCK STEFAN
US61 patents
⚠️ This page may combine multiple inventors who share the name “UHLENBROCK STEFAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
46 patentsUS9865456B1Jan 9, 2018
Methods of forming silicon nitride by atomic layer deposition and methods of forming semiconductor structures
MICRON TECHNOLOGY INC401 citations99
US7115166B2Oct 3, 2006
Systems and methods for forming strontium- and/or barium-containing layers
MICRON TECHNOLOGY INC130 citations99
US6730164B2May 4, 2004
Systems and methods for forming strontium- and/or barium-containing layers
MICRON TECHNOLOGY INC173 citations99
US6452017B1Sep 17, 2002
Complexes having tris(pyrazolyl)methanate ligands
MICRON TECHNOLOGY INC288 citations99
US6319832B1Nov 20, 2001
Methods of making semiconductor devices
MICRON TECHNOLOGY INC108 citations99
US6271131B1Aug 7, 2001
Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers
MICRON TECHNOLOGY INC93 citations99
US5962716AOct 5, 1999
Methods for preparing ruthenium and osmium compounds
MICRON TECHNOLOGY INC94 citations99
US7393785B2Jul 1, 2008
Methods and apparatus for forming rhodium-containing layers
MICRON TECHNOLOGY INC65 citations98
US7250367B2Jul 31, 2007
Deposition methods using heteroleptic precursors
MICRON TECHNOLOGY INC140 citations98
US6998152B2Feb 14, 2006
Chemical vapor deposition methods utilizing ionic liquids
MICRON TECHNOLOGY INC67 citations98
US6541067B1Apr 1, 2003
Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide and method of using same
MICRON TECHNOLOGY INC104 citations98
US6881260B2Apr 19, 2005
Process for direct deposition of ALD RhO2
MICRON TECHNOLOGY INC57 citations96
US6690055B1Feb 10, 2004
Devices containing platinum-rhodium layers and methods
MICRON TECHNOLOGY INC38 citations96
US6656835B2Dec 2, 2003
Process for low temperature atomic layer deposition of Rh
MICRON TECHNOLOGY INC68 citations96
US6517616B2Feb 11, 2003
Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide
MICRON TECHNOLOGY INC47 citations96
US6214729B1Apr 10, 2001
Metal complexes with chelating C-, N-donor ligands for forming metal-containing films
MICRON TECHNOLOGY INC39 citations96
US6114557ASep 5, 2000
Methods for preparing ruthenium and osmium compounds
MICRON TECHNOLOGY INC47 citations96
US6943073B2Sep 13, 2005
Process for low temperature atomic layer deposition of RH
MICRON TECHNOLOGY INC15 citations93
US6844261B2Jan 18, 2005
Method of forming ruthenium and ruthenium oxide films on a semiconductor structure
MICRON TECHNOLOGY INC32 citations93
US6773495B2Aug 10, 2004
Solutions of metal-comprising materials
MICRON TECHNOLOGY INC29 citations93
US6656839B2Dec 2, 2003
Solutions of metal-comprising materials, and methods of making solutions of metal-comprising materials
MICRON TECHNOLOGY INC29 citations93
US6576778B1Jun 10, 2003
Methods for preparing ruthenium and osmium compounds
MICRON TECHNOLOGY INC31 citations93
US6495459B2Dec 17, 2002
Solutions of metal-comprising materials, methods of forming metal-comprising layers, methods of storing metal-comprising materials, and methods of forming capacitors
MICRON TECHNOLOGY INC29 citations93
US6444818B2Sep 3, 2002
Metal complexes with chelating C-, N-donor ligands for forming metal-containing films
MICRON TECHNOLOGY INC23 citations93
US6306217B1Oct 23, 2001
Metal complexes with chelating C-,N-donor ligands for forming metal-containing films
MICRON TECHNOLOGY INC28 citations93
US7572731B2Aug 11, 2009
Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
MICRON TECHNOLOGY INC14 citations92
US7482037B2Jan 27, 2009
Methods for forming niobium and/or vanadium containing layers using atomic layer deposition
MICRON TECHNOLOGY INC9 citations84
US6783657B2Aug 31, 2004
Systems and methods for the electrolytic removal of metals from substrates
MICRON TECHNOLOGY INC14 citations84
US7226861B2Jun 5, 2007
Methods and apparatus for forming rhodium-containing layers
MICRON TECHNOLOGY INC8 citations74
US6352580B1Mar 5, 2002
Complexes having tris(pyrazolyl)borate ligands for forming films
MICRON TECHNOLOGY INC7 citations74
US6133161AOct 17, 2000
Methods of forming a film on a substrate using complexes having tris(pyrazolyl) methanate ligands
MICRON TECHNOLOGY INC9 citations74
US6127192AOct 3, 2000
Complexes having tris (pyrazolyl) borate ligands for forming films
MICRON TECHNOLOGY INC12 citations74
US10964532B2Mar 30, 2021
Methods of forming semiconductor devices comprising silicon nitride on high aspect ratio features
MICRON TECHNOLOGY INC2 citations73
US9929006B2Mar 27, 2018
Silicon chalcogenate precursors, methods of forming the silicon chalcogenate precursors, and related methods of forming silicon nitride and semiconductor structures
MICRON TECHNOLOGY INC3 citations73
US7049237B2May 23, 2006
Methods for planarization of Group VIII metal-containing surfaces using oxidizing gases
MICRON TECHNOLOGY INC8 citations66
US11651955B2May 16, 2023
Methods of forming silicon nitride including plasma exposure
MICRON TECHNOLOGY INC0 citations63
US11538991B2Dec 27, 2022
Methods of forming a memory cell comprising a metal chalcogenide material
MICRON TECHNOLOGY INC0 citations63
US7858523B2Dec 28, 2010
Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
MICRON TECHNOLOGY INC3 citations63
US7837797B2Nov 23, 2010
Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition
MICRON TECHNOLOGY INC4 citations63
US6874335B2Apr 5, 2005
Large scale synthesis of germanium selenide glass and germanium selenide glass compounds
MICRON TECHNOLOGY INC6 citations63
US6872420B2Mar 29, 2005
Methods for preparing ruthenium and osmium compounds and films
MICRON TECHNOLOGY INC3 citations63
US11152205B2Oct 19, 2021
Silicon chalcogenate precursors comprising a chemical formula of si(XR1)nR24-n and methods of forming the silicon chalcogenate precursors
MICRON TECHNOLOGY INC0 citations62
US10651375B2May 12, 2020
Memory cells, semiconductor devices including the memory cells, and methods of operation
MICRON TECHNOLOGY INC0 citations52
US10374156B2Aug 6, 2019
Memory cells including a metal chalcogenide material and related methods
MICRON TECHNOLOGY INC0 citations52
US10283705B2May 7, 2019
Memory cells, semiconductor devices including the memory cells, and methods of operation
MICRON TECHNOLOGY INC0 citations52
US9935264B2Apr 3, 2018
Memory cells and methods of fabrication
MICRON TECHNOLOGY INC0 citations52
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2 patentsUNIV TOLEDO
1 patentMARSH EUGENE P
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