Inventor

STIRNIMAN JOHN P

US6 patents

⚠️ This page may combine multiple inventors who share the name “STIRNIMAN JOHN P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SYNOPSYS INC

3 patents

US7458059B2Nov 25, 2008

Model of sensitivity of a simulated layout to a change in original layout, and use of model in proximity correction

SYNOPSYS INC21 citations89

US7617478B2Nov 10, 2009

Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesis

SYNOPSYS INC13 citations81

US7831954B2Nov 9, 2010

Flash-based updating techniques for high-accuracy high efficiency mask synthesis

SYNOPSYS INC6 citations70

AVANT CORP

2 patents

US6289499B1Sep 11, 2001

Proximity correction software for wafer lithography

AVANT CORP183 citations97

US6081658AJun 27, 2000

Proximity correction system for wafer lithography

AVANT CORP148 citations97

RIEGER MICHAEL L

1 patent

US8490032B2Jul 16, 2013

Flash-based anti-aliasing techniques for high-accuracy high-efficiency mask synthesis

RIEGER MICHAEL L1 citations47