Inventor
BRILLHART PAUL LUKAS
US20 patents
⚠️ This page may combine multiple inventors who share the name “BRILLHART PAUL LUKAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
8 patentsUS8012304B2Sep 6, 2011
Plasma reactor with a multiple zone thermal control feed forward control apparatus
APPLIED MATERIALS INC27 citations96
US8021521B2Sep 20, 2011
Method for agile workpiece temperature control in a plasma reactor using a thermal model
APPLIED MATERIALS INC13 citations92
US7541292B2Jun 2, 2009
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
APPLIED MATERIALS INC12 citations84
US7540971B2Jun 2, 2009
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
APPLIED MATERIALS INC16 citations84
US7431859B2Oct 7, 2008
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
APPLIED MATERIALS INC18 citations84
US8034180B2Oct 11, 2011
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
APPLIED MATERIALS INC14 citations83
US7988872B2Aug 2, 2011
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
APPLIED MATERIALS INC19 citations83
US11853042B2Dec 26, 2023
Part, sensor, and metrology data integration
APPLIED MATERIALS INC2 citations68
BUCHBERGER JR DOUGLAS A
6 patentsUS8608900B2Dec 17, 2013
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
BUCHBERGER JR DOUGLAS A18 citations92
US8329586B2Dec 11, 2012
Method of processing a workpiece in a plasma reactor using feed forward thermal control
BUCHBERGER JR DOUGLAS A11 citations92
US8221580B2Jul 17, 2012
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
BUCHBERGER JR DOUGLAS A14 citations92
US8157951B2Apr 17, 2012
Capacitively coupled plasma reactor having very agile wafer temperature control
BUCHBERGER JR DOUGLAS A18 citations92
US8092639B2Jan 10, 2012
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
BUCHBERGER JR DOUGLAS A20 citations92
US8337660B2Dec 25, 2012
Capacitively coupled plasma reactor having very agile wafer temperature control
BUCHBERGER JR DOUGLAS A12 citations84
BRILLHART PAUL LUKAS
4 patentsUS8980044B2Mar 17, 2015
Plasma reactor with a multiple zone thermal control feed forward control apparatus
BRILLHART PAUL LUKAS10 citations92
US8546267B2Oct 1, 2013
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
BRILLHART PAUL LUKAS5 citations83
US8092638B2Jan 10, 2012
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
BRILLHART PAUL LUKAS15 citations83
US8801893B2Aug 12, 2014
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
BRILLHART PAUL LUKAS5 citations72