Inventor

FOVELL RICHARD

US33 patents

⚠️ This page may combine multiple inventors who share the name “FOVELL RICHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FOVELL RICHARD

APPLIED MATERIALS INC

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Temperature controlled window with a fluid supply system

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding

Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding

Symmetrical inductively coupled plasma source with symmetrical flow chamber

Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates

Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor

Method of operating a capacitively coupled plasma reactor with dual temperature control loops

Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates

Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow

Inductively coupled plasma source with symmetrical RF feed

Inductively coupled plasma source with multiple dielectric windows and window-supporting structure

Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates

Distributed electro-static chuck cooling

Apparatus for controlling temperature uniformity of a showerhead

Methods and apparatus for rapidly responsive heat control in plasma processing devices

Modular microwave source with multiple metal housings

Method of real time in-situ chamber condition monitoring using sensors and RF communication

Method of real time in-situ chamber condition monitoring using sensors and RF communication

Methods and apparatus for processing a substrate

BUCHBERGER JR DOUGLAS A

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Method of processing a workpiece in a plasma reactor using feed forward thermal control

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Capacitively coupled plasma reactor having very agile wafer temperature control

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Capacitively coupled plasma reactor having very agile wafer temperature control

BRILLHART PAUL LUKAS

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor

ZHANG CHUNLEI

Methods and apparatus for rapidly responsive heat control in plasma processing devices

FOVELL RICHARD

Substrate support temperature control